SCHEMBL14670237

SCHEMBL14670237

CCCC(CC(CC)CC(=O)O)C(=O)O

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ADRA1A P35348 2/20 0.56
CHRM1 P11229 1/20 0.56
AKR1A1 P14550 1/20 0.56
CHRM3 P20309 1/20 0.56
HTR2A P28223 1/20 0.56
HTR2C P28335 1/20 0.56
HRH1 P35367 1/20 0.56
DRD3 P35462 1/20 0.56
SLC6A3 Q01959 1/20 0.56
HDAC1 Q13547 1/20 0.56
HDAC2 Q92769 1/20 0.56
TDP1 Q9NUW8 1/20 0.56
SLC1A2 P43004 4/20 0.53
SLC1A1 P43005 4/20 0.53
GRIK1 P39086 3/20 0.53
GRIK2 Q13002 3/20 0.53
SLC1A3 P43003 3/20 0.53
CA2 P00918 1/20 0.44
MAPK1 P28482 1/20 0.44
FOLH1 Q04609 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4899569 0.86 SLC1A3 (0.52) ADRA1ACHRM1AKR1A1CHRM3HTR2A
SCHEMBL9308372 0.84 CHRM1 (0.65) ADRA1ACHRM1AKR1A1CHRM3HTR2A
SCHEMBL12611015 0.81 CHRM1 (0.83) ADRA1ACHRM1AKR1A1CHRM3HTR2A
SCHEMBL3824905 0.81 CA2 (0.59) ADRA1ACHRM1AKR1A1CHRM3HTR2A
SCHEMBL3689591 0.79 FOLH1 (0.46) ADRA1ACHRM1AKR1A1CHRM3HTR2A
SCHEMBL940383 0.79 ADRA1A (0.44) ADRA1ACHRM1AKR1A1CHRM3HTR2A
SCHEMBL29109670 0.79 TDP1 (0.71) ADRA1ACHRM1AKR1A1CHRM3HTR2A
SCHEMBL6454152 0.79 TDP1 (0.71) ADRA1ACHRM1AKR1A1CHRM3HTR2A
SCHEMBL707746 0.79 TDP1 (0.71) ADRA1ACHRM1AKR1A1CHRM3HTR2A
SCHEMBL8677882 0.79 CA2 (0.52) ADRA1ACHRM1AKR1A1CHRM3HTR2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170174922-A1 CONDUCTIVE MATERIAL AND SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-06-22 US disclosed
US-20170130071-A1 CONDUCTIVE MATERIAL AND SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-05-11 US disclosed
US-20170130070-A1 CONDUCTIVE MATERIAL AND SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-05-11 US disclosed
US-9360753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-07 US disclosed
US-9164383-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-10-20 US disclosed
US-20130029270-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-01-31 US disclosed