SCHEMBL1469682

SCHEMBL1469682

O=C(O)C=CCC1CO1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4389137 0.86 GABRR1 (0.34)
Bicarbonate SCHEMBL27847278 0.83 ALDH1A1 (0.33)
SCHEMBL14524879 0.80
SCHEMBL1469403 0.78 TSHR (0.38)
SCHEMBL3269504 0.78 ALDH1A1 (0.42)
SCHEMBL27687037 0.77 MGLL (0.39)
SCHEMBL6141510 0.75 GABRR1 (0.35)
SCHEMBL27354005 0.75 HCAR2 (0.44)
SCHEMBL28635106 0.75 HCAR2 (0.44)
Maleic Acid SCHEMBL27383176 0.74 TSHR (0.43)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114656818-B metal oxide dispersion 凯斯科技股份有限公司 2023-11-17 CN claimed
CN-116648671-A Negative photosensitive resin composition capable of realizing low-temperature curing and low refractive index 株式会社东进世美肯 2023-08-25 CN disclosed
CN-114555680-A Method for producing elastomeric films 昕特玛私人有限公司 2022-05-27 CN disclosed
CN-114206950-A Polymer latex composition for preparing elastomer film with self-repairing property 昕特玛私人有限公司 2022-03-18 CN disclosed
CN-106918989-B Photosensitive polysiloxane composition, protective film and module with protective film 奇美实业股份有限公司 2020-07-31 CN disclosed
CN-110396387-B Heat-activated non-primary-adhesion sealant and preparation method and application thereof 宁波咖飞姆新材料有限公司 2020-03-31 CN disclosed
CN-105440933-B Electron beam curable coatings 广东天安新材料股份有限公司 2018-10-09 CN disclosed
CN-104629506-B Electron beam curing coating, preparation method and application of electron beam curing coating 广东天安新材料股份有限公司 2018-05-11 CN disclosed
US-8486601-B2 Toner for electrostatic latent image development and image forming method KONICA MINOLTA BUSINESS TECHNOLOGIES, INC. (JP) 2013-07-16 US disclosed
US-20110262683-A1 POLYMER ALLOY FIBER AND FIBER STRUCTURE TORAY INDUSTRIES, INC. (JP) 2011-10-27 US disclosed
US-20110070535-A1 TONER FOR ELECTROSTATIC LATENT IMAGE DEVELOPMENT AND IMAGE FORMING METHOD KONICA MINOLTA BUSINESS TECHNOLOGIES, INC. (JP) 2011-03-24 US disclosed