SCHEMBL14701239

SCHEMBL14701239

C=Cc1ccc2c(c1)CC=C(O)C2

nearest known ligand 0.36

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
▸ TRPA1 O75762 1/20 0.36
▸ ALDH1A1 P00352 1/20 0.34
▸ HDAC3 O15379 2/20 0.31
▸ HDAC1 Q13547 2/20 0.31
▸ HDAC2 Q92769 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30786494 0.76 — —
SCHEMBL3297666 0.70 ALDH1A1 (0.46) TRPA1ALDH1A1
SCHEMBL21052427 0.69 CYP1A2 (0.44) TRPA1ALDH1A1HDAC3HDAC1HDAC2
SCHEMBL1697578 0.68 ALDH1A1 (0.48) TRPA1ALDH1A1HDAC3HDAC1HDAC2
SCHEMBL31122823 0.68 ALDH1A1 (0.48) TRPA1ALDH1A1HDAC3HDAC1HDAC2
SCHEMBL1143178 0.68 CYP1A2 (0.40) ALDH1A1
SCHEMBL29475832 0.68 ALDH1A1 (0.48) TRPA1ALDH1A1HDAC3HDAC1HDAC2
SCHEMBL2867311 0.66 ALDH1A1 (0.46) TRPA1ALDH1A1
SCHEMBL7159141 0.65 ALDH1A1 (0.43) TRPA1ALDH1A1
SCHEMBL33130 0.65 ALDH1A1 (0.43) TRPA1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9040225-B2 Developable bottom antireflective coating composition and pattern forming method using thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2015-05-26 — — US disclosed
US-9040225-B2 Developable bottom antireflective coating composition and pattern forming method using thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2015-05-26 — — US disclosed
US-8999624-B2 Developable bottom antireflective coating composition and pattern forming method using thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2015-04-07 — — US disclosed
US-8999624-B2 Developable bottom antireflective coating composition and pattern forming method using thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2015-04-07 — — US disclosed
US-8986918-B2 Hybrid photoresist composition and pattern forming method using thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2015-03-24 — — US disclosed
US-8986918-B2 Hybrid photoresist composition and pattern forming method using thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2015-03-24 — — US disclosed
US-20150050601-A1 DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND PATTERN FORMING METHOD USING THEREOF GLOBALFOUNDRIES U.S. INC. 2015-02-19 — — US disclosed
US-20150050601-A1 DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND PATTERN FORMING METHOD USING THEREOF GLOBALFOUNDRIES U.S. INC. 2015-02-19 — — US disclosed
US-8932796-B2 Hybrid photoresist composition and pattern forming method using thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2015-01-13 — — US disclosed
US-8932796-B2 Hybrid photoresist composition and pattern forming method using thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2015-01-13 — — US disclosed
US-8715907-B2 Developable bottom antireflective coating compositions for negative resists INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-05-06 — — US disclosed
US-8715907-B2 Developable bottom antireflective coating compositions for negative resists INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-05-06 — — US disclosed
US-20140072916-A1 HYBRID PHOTORESIST COMPOSITION AND PATTERN FORMING METHOD USING THEREOF INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-03-13 — — US disclosed
US-20140072916-A1 HYBRID PHOTORESIST COMPOSITION AND PATTERN FORMING METHOD USING THEREOF INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-03-13 — — US disclosed
WO-2013070511-A1 HYBRID PHOTORESIST COMPOSITION AND PATTERN FORMING METHOD USING THEREOF INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-05-16 — — WO disclosed
US-20130122421-A1 HYBRID PHOTORESIST COMPOSITION AND PATTERN FORMING METHOD USING THEREOF INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-05-16 — — US disclosed
US-20130122421-A1 HYBRID PHOTORESIST COMPOSITION AND PATTERN FORMING METHOD USING THEREOF INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-05-16 — — US disclosed
US-20130040238-A1 DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE RESISTS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-02-14 — — US disclosed
US-20130040238-A1 DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE RESISTS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-02-14 — — US disclosed
WO-2013023124-A2 DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE RESISTS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-02-14 — — WO disclosed
Send feedback