SCHEMBL14701295

SCHEMBL14701295

CCCCOCN1C(=O)N(COCCCC)C2C1N(COC)C(=O)N2COCCCC

nearest known ligand 0.38

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
TP53 P04637 1/20 0.38
GAA P10253 1/20 0.38
L3MBTL1 Q9Y468 2/20 0.35
GBA1 P04062 1/20 0.33
TSHR P16473 2/20 0.32
CYP3A4 P08684 1/20 0.32
KDM4A O75164 1/20 0.31
USP2 O75604 1/20 0.31
POLB P06746 1/20 0.31
ALOX15 P16050 1/20 0.31
KDM4C Q9H3R0 1/20 0.31
SMN1; SMN2 Q16637 2/20 0.31
HPGD P15428 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21414084 1.00 TP53 (0.38) TP53GAAL3MBTL1GBA1TSHR
SCHEMBL124787 0.93 GAA (0.42) TP53GAAL3MBTL1GBA1TSHR
SCHEMBL12205532 0.88 L3MBTL1 (0.48) TP53GAAL3MBTL1GBA1TSHR
SCHEMBL16284290 0.88 L3MBTL1 (0.48) TP53GAAL3MBTL1GBA1TSHR
SCHEMBL12230867 0.86 TP53 (0.39) TP53GAAGBA1TSHR
SCHEMBL20634310 0.85 L3MBTL1 (0.55) TP53GAAL3MBTL1GBA1TSHR
SCHEMBL13380167 0.83 GAA (0.55) TP53GAAL3MBTL1GBA1TSHR
SCHEMBL16610347 0.83 GAA (0.55) TP53GAAL3MBTL1GBA1TSHR
SCHEMBL12024038 0.82 L3MBTL1 (0.39) TP53GAAL3MBTL1
SCHEMBL196871 0.81 L3MBTL1 (0.42) TP53GAAL3MBTL1GBA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8986918-B2 Hybrid photoresist composition and pattern forming method using thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2015-03-24 US disclosed
US-8932796-B2 Hybrid photoresist composition and pattern forming method using thereof INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2015-01-13 US disclosed
US-8715907-B2 Developable bottom antireflective coating compositions for negative resists INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-05-06 US disclosed
US-8715907-B2 Developable bottom antireflective coating compositions for negative resists INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-05-06 US disclosed
US-20140072916-A1 HYBRID PHOTORESIST COMPOSITION AND PATTERN FORMING METHOD USING THEREOF INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-03-13 US disclosed
US-20130122421-A1 HYBRID PHOTORESIST COMPOSITION AND PATTERN FORMING METHOD USING THEREOF INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-05-16 US disclosed
US-20130040238-A1 DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE RESISTS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-02-14 US disclosed