Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 3/20 | 0.42 |
| ▸ | TP53 | P04637 | 1/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.39 |
| ▸ | GBA1 | P04062 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 3/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.34 |
| ▸ | HPGD | P15428 | 1/20 | 0.34 |
| ▸ | USP2 | O75604 | 2/20 | 0.34 |
| ▸ | POLB | P06746 | 2/20 | 0.34 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.34 |
| ▸ | KDM4A | O75164 | 1/20 | 0.34 |
| ▸ | KDM4C | Q9H3R0 | 1/20 | 0.34 |
| ▸ | ABL1 | P00519 | 2/20 | 0.33 |
| ▸ | RIN1 | Q13671 | 2/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
| ▸ | RARB | P10826 | 1/20 | 0.32 |
| ▸ | CNOT7 | Q9UIV1 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12205532 | 0.94 | L3MBTL1 (0.48) | GAATP53L3MBTL1GBA1TSHR | |
| SCHEMBL16284290 | 0.94 | L3MBTL1 (0.48) | GAATP53L3MBTL1GBA1TSHR | |
| SCHEMBL14701295 | 0.93 | TP53 (0.38) | GAATP53L3MBTL1GBA1TSHR | |
| SCHEMBL21414084 | 0.93 | TP53 (0.38) | GAATP53L3MBTL1GBA1TSHR | |
| SCHEMBL20634310 | 0.91 | L3MBTL1 (0.55) | GAATP53L3MBTL1GBA1TSHR | |
| SCHEMBL13380167 | 0.89 | GAA (0.55) | GAATP53L3MBTL1GBA1TSHR | |
| SCHEMBL16610347 | 0.89 | GAA (0.55) | GAATP53L3MBTL1GBA1TSHR | |
| SCHEMBL196871 | 0.88 | L3MBTL1 (0.42) | GAATP53L3MBTL1GBA1 | |
| SCHEMBL11372171 | 0.85 | GBA1 (0.42) | GAATP53L3MBTL1GBA1TSHR | |
| SCHEMBL18804148 | 0.84 | L3MBTL1 (0.39) | GAATP53L3MBTL1GBA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 753 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9006145-B2 | Agrochemical formulations of microcapsules for compounds containing carboxamide groups | FMC CORPORATION | 2015-04-14 | — | — | US | claimed |
| US-20120157315-A1 | AGROCHEMICAL FORMULATIONS OF MICROCAPSULES FOR COMPOUNDS CONTAINING CARBOXAMIDE GROUPS | FMC CORPORATION | 2012-06-21 | — | — | US | claimed |
| US-7008476-B2 | Modified alginic acid of alginic acid derivatives and thermosetting anti-reflective compositions thereof | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2006-03-07 | — | — | US | claimed |
| WO-2004111092-A1 | MODIFIED ALGINIC ACID OR ALGINIC ACID DERIVATIVES AND THERMOSETTING ANTI-REFLECTIVE COMPOSITIONS THEREOF | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2004-12-23 | — | — | WO | claimed |
| US-20040253532-A1 | Modified alginic acid of alginic acid derivatives and thermosetting anti-reflective compositions thereof | MERCK PATENT GMBH (DE) | 2004-12-16 | — | — | US | claimed |
| US-6824951-B2 | CROSSLINKING AGENT PREVENTS EXCESSIVE PHOTORESIST RESIN FLOW WHICH MAY RESULT IN A BENT OR COLLAPSED CONTACT HOLE PATTERN PROFILE; SEMICONDUCTORS | HYNIX SEMICONDUCTOR INC. (KR) | 2004-11-30 | — | — | US | claimed |
| US-6630281-B2 | Forming positive pattern | HYNIX SEMICONDUCTOR INC. (KR) | 2003-10-07 | — | — | US | claimed |
| US-20020048723-A1 | Photoresist composition for resist flow process | HYNIX SEMICONDUCTOR INC. (KR) | 2002-04-25 | — | — | US | claimed |
| US-20020031721-A1 | Photoresist composition for top-surface imaging processes by silylation | HYNIX SEMICONDUCTOR INC. (KR) | 2002-03-14 | — | — | US | claimed |
| US-12607936-B2 | Film-forming composition having a multiple bond | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-21 | — | — | US | disclosed |
| US-12598958-B2 | Wafer treatment method | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-07 | — | — | US | disclosed |
| EP-4685840-A1 | RELEASE AGENT COMPOSITION FOR PHOTOIRRADIATION RELEASE, LAYERED PRODUCT, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE | Nissan Chemical Corporation (JP) | 2026-01-28 | — | — | EP | disclosed |
| EP-4678708-A1 | ADHESIVE COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE | Nissan Chemical Corporation (JP) | 2026-01-14 | — | — | EP | disclosed |
| EP-4678709-A1 | ADHESIVE COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE | Nissan Chemical Corporation (JP) | 2026-01-14 | — | — | EP | disclosed |
| US-20030022095-A1 | Negative type radiation sensitive resin composition | JSR CORPORATION (JP) | 2003-01-30 | — | — | US | disclosed |
| US-6468714-B2 | FINE PHOTORESIST PATTERNS | JSR CORPORATION (JP) | 2002-10-22 | — | — | US | disclosed |
| US-20020048723-A1 | Photoresist composition for resist flow process | HYNIX SEMICONDUCTOR INC. (KR) | 2002-04-25 | — | — | US | disclosed |
| US-20020031721-A1 | Photoresist composition for top-surface imaging processes by silylation | HYNIX SEMICONDUCTOR INC. (KR) | 2002-03-14 | — | — | US | disclosed |
| US-20010006758-A1 | Negative radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-07-05 | — | — | US | disclosed |
| EP-1111465-A1 | Negative radiation-sensitive resin composition | JSR Corporation (JP) | 2001-06-27 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12598958-B2 | Wafer treatment method | LIFR, FRK, ZAP70 | GAA 79/4885TP53 1172/4885L3MBTL1 724/4885 |
| US-12607936-B2 | Film-forming composition having a multiple bond | ETV1, ARF1, ETV6 | GAA 4168/4885TP53 3855/4885L3MBTL1 646/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.