SCHEMBL196871

SCHEMBL196871

CCCOCN1C(=O)N(COCCC)C2C1N(COCCC)C(=O)N2COCCC

nearest known ligand 0.42

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 1/20 0.42
GAA P10253 2/20 0.36
TP53 P04637 1/20 0.36
KDM4E B2RXH2 1/20 0.33
GLA P06280 1/20 0.33
GBA1 P04062 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18804148 0.96 L3MBTL1 (0.39) L3MBTL1GAATP53KDM4EGLA
SCHEMBL124787 0.88 GAA (0.42) L3MBTL1GAATP53GBA1
SCHEMBL13058043 0.85 KDM4E (0.33) L3MBTL1GAATP53KDM4EGLA
SCHEMBL13058047 0.83 KDM4E (0.32) L3MBTL1GAATP53KDM4EGLA
SCHEMBL16284290 0.83 L3MBTL1 (0.48) L3MBTL1GAATP53GBA1
SCHEMBL12205532 0.83 L3MBTL1 (0.48) L3MBTL1GAATP53GBA1
SCHEMBL196638 0.82 L3MBTL1 (0.45) L3MBTL1GAATP53
SCHEMBL14701295 0.81 TP53 (0.38) L3MBTL1GAATP53GBA1
SCHEMBL21414084 0.81 TP53 (0.38) L3MBTL1GAATP53GBA1
SCHEMBL18804139 0.81 L3MBTL1 (0.36) L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 170 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7008476-B2 Modified alginic acid of alginic acid derivatives and thermosetting anti-reflective compositions thereof AZ ELECTRONIC MATERIALS USA CORP. (US) 2006-03-07 US claimed
WO-2004111092-A1 MODIFIED ALGINIC ACID OR ALGINIC ACID DERIVATIVES AND THERMOSETTING ANTI-REFLECTIVE COMPOSITIONS THEREOF AZ ELECTRONIC MATERIALS USA CORP. (US) 2004-12-23 WO claimed
US-20040253532-A1 Modified alginic acid of alginic acid derivatives and thermosetting anti-reflective compositions thereof MERCK PATENT GMBH (DE) 2004-12-16 US claimed
US-20260015490-A1 Rubber Compositions Containing Phloroglucinolic Resins for Use in Tire Treads of Heavy Vehicles SUMITOMO CHEMICAL ADVANCED TECH LLC D B A SUMIKA ELECTRONIC MATERIALS (US) 2026-01-15 US disclosed
EP-4554800-A1 RUBBER COMPOSITIONS CONTAINING PHLOROGLUCINOLIC RESINS FOR USE IN TIRE TREADS OF HEAVY VEHICLES Sumitomo Chemical Advanced Technologies LLC (US) 2025-05-21 EP disclosed
CN-119546467-A Rubber composition containing phloroglucinol resin for heavy vehicle tire tread 住友化学先进技术有限责任公司即住化电子材料公司 2025-02-28 CN disclosed
EP-3877459-B1 POLYMER NETWORK FORMING SILANE COMPOSITIONS MOMENTIVE PERFORMANCE MAT INC (US) 2025-01-22 EP disclosed
US-11905428-B2 Resin compositions and methods of production MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2024-02-20 US disclosed
WO-2024015956-A1 RUBBER COMPOSITIONS CONTAINING PHLOROGLUCINOLIC RESINS FOR USE IN TIRE TREADS OF HEAVY VEHICLES SUMITOMO CHEMICAL ADVANCED TECHNOLOGIES, LLC, D.B.A. SUMIKA ELECTRONIC MATERIALS (US) 2024-01-18 WO disclosed
US-11822248-B2 Coating compositions for use with an overcoated photoresist ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) 2023-11-21 US disclosed
US-11822248-B2 Coating compositions for use with an overcoated photoresist ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) 2023-11-21 US disclosed
US-20060228645-A1 Nanocomposite photosensitive composition and use thereof MERCK PATENT GMBH (DE) 2006-10-12 US disclosed
US-7030201-B2 Bottom antireflective coatings AZ ELECTRONIC MATERIALS USA CORP. (US) 2006-04-18 US disclosed
US-7008476-B2 Modified alginic acid of alginic acid derivatives and thermosetting anti-reflective compositions thereof AZ ELECTRONIC MATERIALS USA CORP. (US) 2006-03-07 US disclosed
US-20050112494-A1 Bottom antireflective coatings AZ ELECTRONIC MATERIALS USA CORP. 2005-05-26 US disclosed
US-20040253532-A1 Modified alginic acid of alginic acid derivatives and thermosetting anti-reflective compositions thereof MERCK PATENT GMBH (DE) 2004-12-16 US disclosed
US-20030022095-A1 Negative type radiation sensitive resin composition JSR CORPORATION (JP) 2003-01-30 US disclosed
US-6468714-B2 FINE PHOTORESIST PATTERNS JSR CORPORATION (JP) 2002-10-22 US disclosed
US-20010006758-A1 Negative radiation-sensitive resin composition JSR CORPORATION (JP) 2001-07-05 US disclosed
EP-1111465-A1 Negative radiation-sensitive resin composition JSR Corporation (JP) 2001-06-27 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260015490-A1 Rubber Compositions Containing Phloroglucinolic Resins for Use in Tire Treads of Heavy Vehicles TST, RIF1, SORD L3MBTL1 2177/4885GAA 2141/4885TP53 3024/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.