SCHEMBL14715925

SCHEMBL14715925

CCOC(=O)C(C(F)(F)F)C(F)(F)F

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.43
LMNA P02545 1/20 0.42
HSD17B10 Q99714 1/20 0.42
ALOX15 P16050 1/20 0.40
MGAM O43451 1/20 0.40
GAA P10253 1/20 0.40
SI P14410 1/20 0.40
MGAM2 Q2M2H8 1/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
SOAT1 P35610 1/20 0.40
TRPA1 O75762 1/20 0.37
HDAC4 P56524 2/20 0.35
HDAC6 Q9UBN7 2/20 0.35
HDAC3 O15379 1/20 0.35
HDAC1 Q13547 1/20 0.35
HTT P42858 1/20 0.34
PIN1 Q13526 1/20 0.34
MAPT P10636 1/20 0.34
HIF1A Q16665 1/20 0.34
POLB P06746 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17035368 0.83 ALDH1A1 (0.34) ALDH1A1LMNAHSD17B10ALOX15MGAM
SCHEMBL8597888 0.83 ALDH1A1 (0.34) ALDH1A1LMNAHSD17B10ALOX15MGAM
SCHEMBL20473345 0.80 ALDH1A1 (0.43) ALDH1A1LMNAHSD17B10ALOX15MGAM
SCHEMBL17734192 0.79 ALDH1A1 (0.38) ALDH1A1LMNAHSD17B10MAPT
SCHEMBL6762809 0.78 ALDH1A1 (0.46) ALDH1A1LMNAHSD17B10ALOX15MGAM
SCHEMBL765474 0.78 ALDH1A1 (0.42) ALDH1A1LMNAHSD17B10ALOX15MGAM
SCHEMBL3868205 0.78 ALDH1A1 (0.42) ALDH1A1LMNAHSD17B10ALOX15MGAM
SCHEMBL15443547 0.77 ALDH1A1 (0.46) ALDH1A1LMNAHSD17B10ALOX15MGAM
SCHEMBL22118458 0.76 NAAA (0.34) ALDH1A1MGAMGAASIMGAM2
SCHEMBL6117334 0.76 ALDH1A1 (0.40) ALDH1A1LMNAHSD17B10ALOX15MGAM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9427777-B2 Process for producing charge retention medium ASAHI GLASS COMPANY, LIMITED (JP) 2016-08-30 US claimed
US-9427777-B2 Process for producing charge retention medium ASAHI GLASS COMPANY, LIMITED (JP) 2016-08-30 US disclosed
EP-2648197-A1 METHOD FOR PRODUCING CHARGE RETENTION MEDIUM Asahi Glass Company, Limited (JP) 2013-10-09 EP disclosed
EP-2648196-A1 CHARGE RETENTION MEDIUM Asahi Glass Company, Limited (JP) 2013-10-09 EP disclosed
US-20130261248-A1 CHARGE RETENTION MEDIUM ASAHI GLASS COMPANY, LIMITED (JP) 2013-10-03 US disclosed
US-20130202810-A1 PROCESS FOR PRODUCING CHARGE RETENTION MEDIUM ASAHI GLASS COMPANY, LIMITED (JP) 2013-08-08 US disclosed
US-20130053493-A1 METHOD FOR PRODUCING FLUORINATED COPOLYMER COMPOSITION, COATING COMPOSITION, ARTICLE HAVING COATING FILM, AND MOLDED PRODUCT ASAHI GLASS COMPANY, LIMITED (JP) 2013-02-28 US disclosed