Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.39 |
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | CA1 | P00915 | 2/20 | 0.35 |
| ▸ | LMNA | P02545 | 3/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | CA4 | P22748 | 2/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL728853 | 0.90 | ALDH1A1 (0.41) | ALDH1A1TSHRLMNAHSD17B10TDP1 | |
| SCHEMBL10729468 | 0.78 | ALDH1A1 (0.37) | ALDH1A1TSHRLMNAHSD17B10TDP1 | |
| SCHEMBL7053117 | 0.78 | — | — | |
| SCHEMBL63651 | 0.76 | ALDH1A1 (0.41) | ALDH1A1TSHRLMNAHSD17B10TDP1 | |
| SCHEMBL338658 | 0.76 | — | — | |
| SCHEMBL5361795 | 0.76 | ALDH1A1 (0.41) | ALDH1A1TSHRLMNAHSD17B10TDP1 | |
| SCHEMBL74717 | 0.76 | ALDH1A1 (0.41) | ALDH1A1TSHRLMNAHSD17B10TDP1 | |
| SCHEMBL728864 | 0.75 | ALDH1A1 (0.42) | ALDH1A1TSHRLMNAHSD17B10TDP1 | |
| SCHEMBL23781789 | 0.73 | ALDH1A1 (0.39) | ALDH1A1TSHRLMNAHSD17B10TDP1 | |
| SCHEMBL1498070 | 0.73 | ALDH1A1 (0.39) | ALDH1A1TSHRLMNAHSD17B10TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117059479-A | Pattern forming method, pattern and semiconductor device | 成都高真科技有限公司 | 2023-11-14 | — | — | CN | disclosed |
| US-8759223-B2 | Double patterning etching process | APPLIED MATERIALS, INC. (US) | 2014-06-24 | — | — | US | disclosed |
| WO-2013032873-A1 | DOUBLE PATTERNING ETCHING PROCESS | APPLIED MATERIALS, INC. (US) | 2013-03-07 | — | — | WO | disclosed |
| US-20130048605-A1 | DOUBLE PATTERNING ETCHING PROCESS | APPLIED MATERIALS, INC. (US) | 2013-02-28 | — | — | US | disclosed |