SCHEMBL728853

SCHEMBL728853

CC(=O)O[Si](C)(OC(C)=O)[Si](C)(OC(C)=O)OC(C)=O

nearest known ligand 0.41

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.41
TSHR P16473 3/20 0.41
LMNA P02545 3/20 0.33
HSD17B10 Q99714 2/20 0.33
TDP1 Q9NUW8 1/20 0.33
THPO P40225 1/20 0.31
FFAR3 O14843 1/20 0.31
LCK P06239 1/20 0.31
FYN P06241 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14717882 0.90 ALDH1A1 (0.39) ALDH1A1TSHRLMNAHSD17B10TDP1
SCHEMBL338658 0.79
SCHEMBL74717 0.79 ALDH1A1 (0.41) ALDH1A1TSHRLMNAHSD17B10TDP1
SCHEMBL63651 0.79 ALDH1A1 (0.41) ALDH1A1TSHRLMNAHSD17B10TDP1
SCHEMBL5361795 0.79 ALDH1A1 (0.41) ALDH1A1TSHRLMNAHSD17B10TDP1
SCHEMBL728864 0.78 ALDH1A1 (0.42) ALDH1A1TSHRLMNAHSD17B10TDP1
SCHEMBL23781789 0.76 ALDH1A1 (0.39) ALDH1A1TSHRLMNAHSD17B10TDP1
SCHEMBL1498070 0.76 ALDH1A1 (0.39) ALDH1A1TSHRLMNAHSD17B10TDP1
SCHEMBL22711080 0.76 ALDH1A1 (0.39) ALDH1A1TSHRLMNAHSD17B10TDP1
SCHEMBL9704519 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 74 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3663301-B1 BORON-CONTAINING COMPOUNDS, COMPOSITIONS, AND METHODS FOR THE DEPOSITION OF BORON CONTAINING FILMS VERSUM MAT US LLC (US) 2023-08-30 EP claimed
CN-107636852-B Method for depositing porous organosilicate glass films for use as resistive random access memories 弗萨姆材料美国有限责任公司 2021-06-25 CN claimed
US-10985013-B2 Method and precursors for manufacturing 3D devices VERSUM MATERIALS US, LLC (US) 2021-04-20 US claimed
US-20190304775-A1 Method and Precursors for Manufacturing 3D Devices VERSUM MATERIALS US, LLC (US) 2019-10-03 US claimed
US-10354860-B2 Method and precursors for manufacturing 3D devices VERSUM MATERIALS US, LLC (US) 2019-07-16 US claimed
US-20180047898-A1 PROCESS FOR DEPOSITING POROUS ORGANOSILICATE GLASS FILMS FOR USE AS RESISTIVE RANDOM ACCESS MEMORY AIR PRODUCTS AND CHEMICALS, INC. 2018-02-15 US claimed
EP-2412011-B1 CHEMICAL VAPOR DEPOSITION METHOD TOKYO ELECTRON LTD (JP) 2017-09-20 EP claimed
US-20160225616-A1 METHOD AND PRECURSORS FOR MANUFACTURING 3D DEVICES AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-08-04 US claimed
EP-3051001-A2 METHOD AND PRECURSORS FOR MANUFACTURING 3D DEVICES AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-08-03 EP claimed
US-9212420-B2 Chemical vapor deposition method TOKYO ELECTRON LIMITED (JP) 2015-12-15 US claimed
EP-1482070-B1 MECHANICAL ENHANCER ADDITIVES FOR LOW DIELECTRIC FILMS AIR PROD & CHEM (US) 2015-11-11 EP claimed
US-8137764-B2 organosilicate film formed by plasma-enhanced chemical vapor deposition from a first silicon-containing precursor that comprises from 3 to 4 Si O bonds per Si atom, from 0 to 1 of Si H, Si Br, and Si Cl bonds per Si atom and a second silicon-containing precursor comprises at least one Si C bond per Si AIR PRODUCTS AND CHEMICALS, INC. (US) 2012-03-20 US claimed
US-20100247803-A1 Chemical vapor deposition method TOKYO ELECTRON LIMITED (JP) 2010-09-30 US claimed
US-20090096106-A1 ANTIREFLECTIVE COATINGS AIR PRODUCTS AND CHEMICALS, INC. (US) 2009-04-16 US claimed
EP-2048700-A2 Antireflective coatings Air Products and Chemicals, Inc. (US) 2009-04-15 EP claimed
US-20040241463-A1 Mechanical enhancer additives for low dielectric films VERSUM MATERIALS US, LLC 2004-12-02 US claimed
EP-1482070-A1 Mechanical enhancer additives for low dielectric films AIR PRODUCTS AND CHEMICALS, INC. (US) 2004-12-01 EP claimed
US-11605535-B2 Boron-containing compounds, compositions, and methods for the deposition of a boron containing films VERSUM MATERIALS US, LLC (US) 2023-03-14 US disclosed
US-20030198742-A1 Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants VERSUM MATERIALS US, LLC 2003-10-23 US disclosed
EP-1354980-A1 Method for forming a porous SiOCH layer. AIR PRODUCTS AND CHEMICALS, INC. (US) 2003-10-22 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11605535-B2 Boron-containing compounds, compositions, and methods for the deposition of a boron containing films CD79B, BCL6B, BCL6 ALDH1A1 3534/4885TSHR 4628/4885LMNA 242/4885
US-10354860-B2 Method and precursors for manufacturing 3D devices MEF2D, HTR3D, NSD3 ALDH1A1 4640/4885TSHR 3442/4885LMNA 3947/4885
US-20190304775-A1 Method and Precursors for Manufacturing 3D Devices MEF2D, HTR3D, NSD3 ALDH1A1 4640/4885TSHR 3442/4885LMNA 3947/4885
US-10985013-B2 Method and precursors for manufacturing 3D devices MEF2D, HTR3D, NSD3 ALDH1A1 4640/4885TSHR 3442/4885LMNA 3947/4885
US-20160225616-A1 METHOD AND PRECURSORS FOR MANUFACTURING 3D DEVICES MEF2D, HTR3D, NSD3 ALDH1A1 4640/4885TSHR 3442/4885LMNA 3947/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.