Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 5/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | HTT | P42858 | 4/20 | 0.35 |
| ▸ | LMNA | P02545 | 2/20 | 0.35 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | CRHBP | P24387 | 1/20 | 0.35 |
| ▸ | CRHR2 | Q13324 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | PRMT5 | O14744 | 2/20 | 0.34 |
| ▸ | WDR77 | Q9BQA1 | 2/20 | 0.34 |
| ▸ | RGS12 | O14924 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | APOBEC3A | P31941 | 2/20 | 0.33 |
| ▸ | APOBEC3G | Q9HC16 | 2/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | CTDSP1 | Q9GZU7 | 1/20 | 0.32 |
| ▸ | CD81 | P60033 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23830103 | 1.00 | ALDH1A1 (0.39) | ALDH1A1KDM4EMAPTHTTLMNA | |
| SCHEMBL465988 | 0.78 | EPHX1 (0.36) | HTTLMNACD81EPHX1 | |
| SCHEMBL720062 | 0.75 | CD81 (0.37) | KDM4EHTTCD81EPHX1 | |
| SCHEMBL226416 | 0.75 | CD81 (0.34) | CD81EPHX1 | |
| SCHEMBL21404629 | 0.74 | NAAA (0.33) | SMN1; SMN2EPHX1 | |
| SCHEMBL5050873 | 0.74 | MAPT (0.33) | ALDH1A1KDM4EMAPTCD81 | |
| SCHEMBL2763358 | 0.74 | MAPT (0.33) | ALDH1A1KDM4EMAPTCD81 | |
| SCHEMBL22845686 | 0.73 | KDM4E (0.43) | ALDH1A1KDM4EMAPTHTTLMNA | |
| SCHEMBL13907638 | 0.73 | KDM4E (0.49) | ALDH1A1KDM4EMAPTHTTLMNA | |
| SCHEMBL9339953 | 0.73 | CD81 (0.36) | CD81 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115850596-A | Transparent photosensitive polyimide resin and preparation method and application thereof | 中国科学院化学研究所 | 2023-03-28 | — | — | CN | claimed |
| US-20250341778-A1 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING POLYIMIDE AND CURED RELIEF PATTERN USING SAME | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2025-11-06 | — | — | US | disclosed |
| US-12386259-B2 | Negative-type photosensitive resin composition and method for producing polyimide and cured relief pattern using same | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2025-08-12 | — | — | US | disclosed |
| US-20240045329-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELECTRONIC COMPONENT, ANTENNA ELEMENT, SEMICONDUCTOR PACKAGE, AND COMPOUND | TORAY INDUSTRIES, INC. (JP) | 2024-02-08 | — | — | US | disclosed |
| CN-115850596-A | Transparent photosensitive polyimide resin and preparation method and application thereof | 中国科学院化学研究所 | 2023-03-28 | — | — | CN | disclosed |
| CN-115236938-B | Negative photosensitive polyamic acid ester resin composition and use thereof | 明士(北京)新材料开发有限公司 | 2023-01-10 | — | — | CN | disclosed |
| US-20210294213-A1 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING POLYIMIDE AND CURED RELIEF PATTERN USING SAME | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2021-09-23 | — | — | US | disclosed |
| US-20130049264-A1 | PROCESS FOR PRODUCING FLEXOGRAPHIC PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, FLEXOGRAPHIC PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR MAKING FLEXOGRAPHIC PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2013-02-28 | — | — | US | disclosed |