Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX1 | P07099 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 2/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19821893 | 0.81 | KDM4E (0.34) | TSHRALDH1A1TDP1 | |
| SCHEMBL19821952 | 0.78 | ALDH1A1 (0.31) | EPHX1TSHRALDH1A1TDP1 | |
| SCHEMBL19018760 | 0.74 | EPHX1 (0.41) | EPHX1TSHRALDH1A1TDP1 | |
| SCHEMBL19821812 | 0.70 | TSHR (0.40) | TSHRALDH1A1TDP1 | |
| SCHEMBL9075110 | 0.69 | — | — | |
| SCHEMBL24851322 | 0.68 | PRKCA (0.37) | EPHX1TSHR | |
| SCHEMBL19821967 | 0.67 | — | — | |
| SCHEMBL19821801 | 0.67 | TSHR (0.48) | TSHRALDH1A1TDP1 | |
| SCHEMBL24909497 | 0.67 | EPHX1 (0.39) | EPHX1TSHRALDH1A1 | |
| SCHEMBL249164 | 0.66 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8790866-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-07-29 | — | — | US | disclosed |
| US-8790866-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-07-29 | — | — | US | disclosed |
| US-20130052587-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-02-28 | — | — | US | disclosed |
| US-20130052587-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-02-28 | — | — | US | disclosed |