SCHEMBL1477205

SCHEMBL1477205

C1=CC2CCC1C2.CCCCCCCCCCC(C)C(=O)O

nearest known ligand 0.56

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ACE2 Q9BYF1 1/20 0.56
GPR84 Q9NQS5 5/20 0.43
CA1 P00915 2/20 0.43
FFAR1 O14842 2/20 0.43
MAPT P10636 1/20 0.42
LCK P06239 1/20 0.42
PPARD Q03181 1/20 0.42
ZDHHC20 Q5W0Z9 1/20 0.42
ZDHHC2 Q9UIJ5 1/20 0.42
FFAR4 Q5NUL3 1/20 0.40
FAAH O00519 1/20 0.39
LTA4H P09960 1/20 0.39
BLM P54132 1/20 0.39
TBXAS1 P24557 2/20 0.38
CCR2 P41597 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1477158 1.00 ACE2 (0.56) ACE2GPR84CA1FFAR1MAPT
SCHEMBL1477507 1.00 ACE2 (0.56) ACE2GPR84CA1FFAR1MAPT
SCHEMBL1476651 1.00 ACE2 (0.56) ACE2GPR84CA1FFAR1MAPT
SCHEMBL1477469 0.94 ACE2 (0.46) ACE2GPR84CA1FFAR1MAPT
SCHEMBL1477054 0.92 ACE2 (0.48) ACE2FFAR1MAPTPPARDFFAR4
SCHEMBL1477159 0.87 ACE2 (0.41) ACE2MAPTLTA4HBLM
SCHEMBL5859121 0.83 CYP1A2 (0.48) ACE2FFAR1MAPTFFAR4LTA4H
SCHEMBL957637 0.81 ACE2 (0.49) ACE2GPR84CA1FFAR1MAPT
SCHEMBL19666662 0.81 CA2 (0.58) ACE2GPR84CA1FFAR1MAPT
SCHEMBL247871 0.81 ACE2 (0.80) ACE2GPR84CA1FFAR1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102391423-B Photoreactive norbornene copolymer, method of preparing the same, and alignment film comprising the same LG CHEM, LTD. (KR) 2016-02-24 CN claimed
CN-102391423-B Photoreactive norbornene copolymer, method of preparing the same, and alignment film comprising the same LG CHEM, LTD. (KR) 2016-02-24 CN disclosed
CN-101918513-B Composition for liquid crystal alignment layer, preparation method of liquid crystal alignment layer using the same, and optical film comprising the liquid crystal alignment layer LG CHEMICAL LTD 2013-05-08 CN disclosed
CN-101782701-B Optical film, preparation method of the same, and liquid crystal display comprising the same LG ELECTRONICS INC 2012-09-05 CN disclosed
CN-102391423-A Photoreactive norbornene copolymer, method of preparing the same, and alignment film comprising the same LG CHEMICAL LTD 2012-03-28 CN disclosed
US-7915467-B2 layer contains a cyclic olefin resin having an epoxy group and a photoacid generator; low stress properties and adhesion; prevent breakage of the semiconductor wafer in a process for grinding the backside to make them thinner SUMITOMO BAKELITE COMPANY, LTD. (JP) 2011-03-29 US disclosed
CN-101918513-A Composition for liquid crystal alignment layer, preparation method of liquid crystal alignment layer using the same, and optical film comprising the liquid crystal alignment layer LG CHEMICAL LTD 2010-12-15 CN disclosed
US-7808083-B2 Semiconductor device SUMITOMO BAKELITE COMPANY, LTD. (JP) 2010-10-05 US disclosed
US-20100120937-A1 SEMICONDUCTOR DEVICE SUMITOMO BAKELITE CO., LTD. (JP) 2010-05-13 US disclosed
US-20080277805-A1 Semiconductor Device SUMITOMO BAKELITE CO., LTD. (JP) 2008-11-13 US disclosed
US-20080090176-A1 Semiconductor Wafer And Semiconductor Device SUMITOMO BAKELITE CO., LTD. (JP) 2008-04-17 US disclosed
EP-1804291-A1 SEMICONDUCTOR WAFER AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-07-04 EP disclosed
EP-1801872-A1 SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-06-27 EP disclosed