SCHEMBL14789771

SCHEMBL14789771

CC(C)(C)OCON1C(=O)C=CC1=O

nearest known ligand 0.33

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
MGLL Q99685 2/20 0.33
GMNN O75496 1/20 0.33
ALDH1A1 P00352 1/20 0.33
LMNA P02545 1/20 0.33
MAPT P10636 1/20 0.33
THPO P40225 1/20 0.33
BLM P54132 1/20 0.33
PMP22 Q01453 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33
GSK3A P49840 1/20 0.32
GSK3B P49841 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14789767 0.76 MGLL (0.37) MGLLGMNNALDH1A1LMNAMAPT
SCHEMBL18650107 0.74 MGLL (0.36) MGLLGMNNALDH1A1LMNAMAPT
SCHEMBL14789790 0.71 MGLL (0.48) MGLLGMNNALDH1A1LMNAMAPT
SCHEMBL6690331 0.70 MGLL (0.39) MGLLGMNNALDH1A1LMNAMAPT
SCHEMBL13554378 0.70 MGLL (0.46) MGLLGMNNALDH1A1LMNAMAPT
SCHEMBL14789765 0.69 ALDH1A1 (0.37) MGLLGMNNALDH1A1LMNAMAPT
SCHEMBL15431752 0.67 MGLL (0.57) MGLLGMNNALDH1A1LMNAMAPT
SCHEMBL15892773 0.66 MGLL (0.35) MGLLGMNNALDH1A1LMNAMAPT
SCHEMBL7584719 0.65 ALDH1A1 (0.36) MGLLGMNNALDH1A1LMNAMAPT
SCHEMBL11939685 0.64 MGLL (0.31) MGLLGMNNALDH1A1LMNAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8865390-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-10-21 US disclosed
US-8865390-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-10-21 US disclosed
US-20130071788-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-03-21 US disclosed
US-20130071788-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-03-21 US disclosed