SCHEMBL14798085

SCHEMBL14798085

[N-]=[N+]=NS(=O)(=O)c1ccc(CCC[SiH2]C(Cl)Cl)cc1

nearest known ligand 0.34

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
▸ BCL2L1 Q07817 2/20 0.34
▸ BAK1 Q16611 2/20 0.34
▸ CA2 P00918 6/20 0.32
▸ SMN1; SMN2 Q16637 1/20 0.32
▸ CA9 Q16790 1/20 0.32
▸ ALDH1A1 P00352 1/20 0.30
▸ TP53 P04637 1/20 0.30
▸ GAA P10253 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14797977 0.83 BCL2L1 (0.34) BCL2L1BAK1CA2SMN1; SMN2CA9
SCHEMBL14798088 0.82 CA1 (0.35) BCL2L1BAK1CA2CA9ALDH1A1
SCHEMBL14798157 0.81 CA2 (0.34) BCL2L1BAK1CA2SMN1; SMN2
SCHEMBL6014622 0.81 CA2 (0.45) BCL2L1BAK1CA2SMN1; SMN2CA9
SCHEMBL14798079 0.79 CA2 (0.38) BCL2L1BAK1CA2SMN1; SMN2
SCHEMBL11595972 0.77 CA2 (0.56) CA2SMN1; SMN2CA9ALDH1A1
SCHEMBL17704474 0.77 MAOB (0.42) BCL2L1BAK1CA2ALDH1A1TP53
SCHEMBL14797979 0.76 CA2 (0.36) BCL2L1BAK1CA2SMN1; SMN2CA9
SCHEMBL969243 0.74 CA2 (0.55) CA2SMN1; SMN2CA9ALDH1A1TP53
SCHEMBL28459415 0.74 CA2 (0.55) CA2SMN1; SMN2CA9ALDH1A1TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9291908-B2 Method of forming pattern and laminate KABUSHIKI KAISHA TOSHIBA (JP) 2016-03-22 — — US disclosed
US-20150261092-A1 METHOD OF FORMING PATTERN AND LAMINATE KABUSHIKI KAISHA TOSHIBA (JP) 2015-09-17 — — US disclosed
US-9073284-B2 Method of forming pattern and laminate KABUSHIKI KAISHA TOSHIBA (JP) 2015-07-07 — — US disclosed
US-20130078570-A1 METHOD OF FORMING PATTERN AND LAMINATE TOSHIBA MEMORY CORPORATION (JP) 2013-03-28 — — US disclosed
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