SCHEMBL14798157

SCHEMBL14798157

CCOC(OCC)[SiH2]CCCc1ccc(S(=O)(=O)N=[N+]=[N-])cc1

nearest known ligand 0.34

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
▸ CA2 P00918 5/20 0.34
▸ CA1 P00915 2/20 0.34
▸ SMN1; SMN2 Q16637 3/20 0.34
▸ BCL2L1 Q07817 2/20 0.32
▸ BAK1 Q16611 2/20 0.32
▸ LMNA P02545 2/20 0.30
▸ HTT P42858 2/20 0.30
▸ TSHR P16473 1/20 0.30
▸ MLNR O43193 1/20 0.30
▸ KDM4E B2RXH2 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14798079 0.91 CA2 (0.38) CA2CA1SMN1; SMN2BCL2L1BAK1
SCHEMBL14797977 0.88 BCL2L1 (0.34) CA2CA1SMN1; SMN2BCL2L1BAK1
SCHEMBL14798249 0.85 CA1 (0.38) CA2CA1SMN1; SMN2HTTTSHR
SCHEMBL14798085 0.81 BCL2L1 (0.34) CA2SMN1; SMN2BCL2L1BAK1
SCHEMBL11595972 0.78 CA2 (0.56) CA2CA1SMN1; SMN2LMNAHTT
SCHEMBL14798352 0.77 TSHR (0.40) CA2CA1SMN1; SMN2LMNAHTT
SCHEMBL6014622 0.76 CA2 (0.45) CA2CA1SMN1; SMN2BCL2L1BAK1
SCHEMBL28459415 0.75 CA2 (0.55) CA2CA1SMN1; SMN2LMNAHTT
SCHEMBL969243 0.75 CA2 (0.55) CA2CA1SMN1; SMN2LMNAHTT
SCHEMBL31594518 0.74 CA2 (0.53) CA2SMN1; SMN2BCL2L1BAK1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9291908-B2 Method of forming pattern and laminate KABUSHIKI KAISHA TOSHIBA (JP) 2016-03-22 — — US disclosed
US-20150261092-A1 METHOD OF FORMING PATTERN AND LAMINATE KABUSHIKI KAISHA TOSHIBA (JP) 2015-09-17 — — US disclosed
US-9073284-B2 Method of forming pattern and laminate KABUSHIKI KAISHA TOSHIBA (JP) 2015-07-07 — — US disclosed
US-20130078570-A1 METHOD OF FORMING PATTERN AND LAMINATE TOSHIBA MEMORY CORPORATION (JP) 2013-03-28 — — US disclosed
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