SCHEMBL14798088

SCHEMBL14798088

[N-]=[N+]=NS(=O)(=O)c1ccc(OCCC[SiH2]C(Cl)Cl)cc1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CA1 P00915 7/20 0.35
▸ CA2 P00918 7/20 0.35
▸ CA9 Q16790 7/20 0.35
▸ CA12 O43570 5/20 0.35
▸ CA7 P43166 2/20 0.35
▸ TSHR P16473 2/20 0.35
▸ MMP2 P08253 2/20 0.34
▸ MMP13 P45452 2/20 0.34
▸ MMP9 P14780 1/20 0.34
▸ MMP8 P22894 1/20 0.34
▸ MEN1 O00255 2/20 0.33
▸ KMT2A Q03164 2/20 0.33
▸ CA4 P22748 4/20 0.32
▸ CA5A P35218 2/20 0.32
▸ CA5B Q9Y2D0 2/20 0.32
▸ ADAMTS4 O75173 1/20 0.32
▸ MMP1 P03956 1/20 0.32
▸ MMP14 P50281 1/20 0.32
▸ ADAMTS5 Q9UNA0 1/20 0.32
▸ BCL2L1 Q07817 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14798457 0.85 CA1 (0.37) CA1CA2CA9CA12CA7
SCHEMBL14798249 0.83 CA1 (0.38) CA1CA2CA9CA12CA7
SCHEMBL14798352 0.82 TSHR (0.40) CA1CA2CA9CA12CA7
SCHEMBL19874475 0.82 CA12 (0.44) CA1CA2CA9CA12CA7
SCHEMBL19874527 0.82 CA12 (0.44) CA1CA2CA9CA12CA7
SCHEMBL14798085 0.82 BCL2L1 (0.34) CA2CA9BCL2L1BAK1ALDH1A1
SCHEMBL19887232 0.78 CA1 (0.39) CA1CA2CA9CA12CA7
SCHEMBL14798633 0.77 CA12 (0.38) CA1CA2CA9CA12CA7
SCHEMBL19891667 0.77 CA1 (0.38) CA1CA2CA9CA12CA7
SCHEMBL14798078 0.75 CA1 (0.39) CA1CA2CA9CA12CA7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9291908-B2 Method of forming pattern and laminate KABUSHIKI KAISHA TOSHIBA (JP) 2016-03-22 — — US disclosed
US-20150261092-A1 METHOD OF FORMING PATTERN AND LAMINATE KABUSHIKI KAISHA TOSHIBA (JP) 2015-09-17 — — US disclosed
US-9073284-B2 Method of forming pattern and laminate KABUSHIKI KAISHA TOSHIBA (JP) 2015-07-07 — — US disclosed
US-20130078570-A1 METHOD OF FORMING PATTERN AND LAMINATE TOSHIBA MEMORY CORPORATION (JP) 2013-03-28 — — US disclosed
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