SCHEMBL14798457

SCHEMBL14798457

COC(OC)[SiH2]CCCOc1ccc(S(=O)(=O)N=[N+]=[N-])cc1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CA1 P00915 5/20 0.37
▸ CA2 P00918 5/20 0.37
▸ CA9 Q16790 5/20 0.37
▸ CA12 O43570 4/20 0.37
▸ TSHR P16473 3/20 0.37
▸ CA7 P43166 2/20 0.37
▸ MMP2 P08253 2/20 0.35
▸ MMP9 P14780 2/20 0.35
▸ MMP8 P22894 2/20 0.35
▸ MMP13 P45452 2/20 0.35
▸ BCL2L1 Q07817 1/20 0.33
▸ BAK1 Q16611 1/20 0.33
▸ MEN1 O00255 1/20 0.32
▸ KMT2A Q03164 1/20 0.32
▸ L3MBTL1 Q9Y468 2/20 0.32
▸ MAPK1 P28482 1/20 0.32
▸ RECQL P46063 1/20 0.32
▸ ALDH1A1 P00352 1/20 0.32
▸ LMNA P02545 1/20 0.31
▸ HTT P42858 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14798249 0.88 CA1 (0.38) CA1CA2CA9CA12TSHR
SCHEMBL14798352 0.87 TSHR (0.40) CA1CA2CA9CA12TSHR
SCHEMBL14798088 0.85 CA1 (0.35) CA1CA2CA9CA12TSHR
SCHEMBL14797977 0.84 BCL2L1 (0.34) CA1CA2CA9BCL2L1BAK1
SCHEMBL19874527 0.80 CA12 (0.44) CA1CA2CA9CA12TSHR
SCHEMBL19874475 0.80 CA12 (0.44) CA1CA2CA9CA12TSHR
SCHEMBL14798582 0.76 TSHR (0.39) CA1CA2CA9CA12TSHR
SCHEMBL19887232 0.76 CA1 (0.39) CA1CA2CA9CA12TSHR
SCHEMBL19891667 0.76 CA1 (0.38) CA1CA2CA9CA12TSHR
SCHEMBL14798242 0.75 CA1 (0.38) CA1CA2CA9CA12TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9291908-B2 Method of forming pattern and laminate KABUSHIKI KAISHA TOSHIBA (JP) 2016-03-22 — — US disclosed
US-20150261092-A1 METHOD OF FORMING PATTERN AND LAMINATE KABUSHIKI KAISHA TOSHIBA (JP) 2015-09-17 — — US disclosed
US-9073284-B2 Method of forming pattern and laminate KABUSHIKI KAISHA TOSHIBA (JP) 2015-07-07 — — US disclosed
US-20130078570-A1 METHOD OF FORMING PATTERN AND LAMINATE TOSHIBA MEMORY CORPORATION (JP) 2013-03-28 — — US disclosed
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