SCHEMBL14798249

SCHEMBL14798249

CCOC(OCC)[SiH2]CCCOc1ccc(S(=O)(=O)N=[N+]=[N-])cc1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CA1 P00915 5/20 0.38
▸ CA2 P00918 5/20 0.38
▸ CA9 Q16790 5/20 0.38
▸ CA12 O43570 4/20 0.38
▸ CA7 P43166 3/20 0.38
▸ TSHR P16473 3/20 0.38
▸ MMP2 P08253 2/20 0.34
▸ MMP13 P45452 2/20 0.34
▸ MMP9 P14780 1/20 0.34
▸ MMP8 P22894 1/20 0.34
▸ MAPK1 P28482 1/20 0.33
▸ RECQL P46063 1/20 0.33
▸ L3MBTL1 Q9Y468 1/20 0.33
▸ SMN1; SMN2 Q16637 3/20 0.32
▸ CYP1A2 P05177 1/20 0.32
▸ CYP3A4 P08684 1/20 0.32
▸ CYP2D6 P10635 1/20 0.32
▸ CYP2C9 P11712 1/20 0.32
▸ CYP2C19 P33261 1/20 0.32
▸ HTT P42858 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14798352 0.92 TSHR (0.40) CA1CA2CA9CA12CA7
SCHEMBL14798457 0.88 CA1 (0.37) CA1CA2CA9CA12CA7
SCHEMBL14798157 0.85 CA2 (0.34) CA1CA2TSHRSMN1; SMN2HTT
SCHEMBL14798088 0.83 CA1 (0.35) CA1CA2CA9CA12CA7
SCHEMBL14798079 0.78 CA2 (0.38) CA1CA2SMN1; SMN2
SCHEMBL19874527 0.78 CA12 (0.44) CA1CA2CA9CA12CA7
SCHEMBL19874475 0.78 CA12 (0.44) CA1CA2CA9CA12CA7
SCHEMBL14805176 0.78 CA12 (0.54) CA1CA2CA9CA12CA7
SCHEMBL14798643 0.75 CA12 (0.40) CA1CA2CA9CA12CA7
SCHEMBL19887232 0.74 CA1 (0.39) CA1CA2CA9CA12CA7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9291908-B2 Method of forming pattern and laminate KABUSHIKI KAISHA TOSHIBA (JP) 2016-03-22 — — US disclosed
US-20150261092-A1 METHOD OF FORMING PATTERN AND LAMINATE KABUSHIKI KAISHA TOSHIBA (JP) 2015-09-17 — — US disclosed
US-9073284-B2 Method of forming pattern and laminate KABUSHIKI KAISHA TOSHIBA (JP) 2015-07-07 — — US disclosed
US-20130078570-A1 METHOD OF FORMING PATTERN AND LAMINATE TOSHIBA MEMORY CORPORATION (JP) 2013-03-28 — — US disclosed
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