SCHEMBL14798352

SCHEMBL14798352

CCCOC(OCCC)[SiH2]CCCOc1ccc(S(=O)(=O)N=[N+]=[N-])cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TSHR P16473 5/20 0.40
▸ CA12 O43570 3/20 0.40
▸ CA1 P00915 3/20 0.40
▸ CA2 P00918 3/20 0.40
▸ CA9 Q16790 3/20 0.40
▸ CA7 P43166 2/20 0.40
▸ MAPK1 P28482 1/20 0.35
▸ RECQL P46063 1/20 0.35
▸ L3MBTL1 Q9Y468 1/20 0.35
▸ SMN1; SMN2 Q16637 4/20 0.33
▸ MMP1 P03956 3/20 0.33
▸ MMP13 P45452 3/20 0.33
▸ LMNA P02545 3/20 0.33
▸ HTT P42858 3/20 0.33
▸ MMP2 P08253 2/20 0.33
▸ MMP9 P14780 2/20 0.33
▸ PTGS2 P35354 1/20 0.33
▸ ADAMTS4 O75173 1/20 0.33
▸ MMP14 P50281 1/20 0.33
▸ ADAMTS5 Q9UNA0 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14798249 0.92 CA1 (0.38) TSHRCA12CA1CA2CA9
SCHEMBL14798457 0.87 CA1 (0.37) TSHRCA12CA1CA2CA9
SCHEMBL14798079 0.86 CA2 (0.38) CA1CA2SMN1; SMN2
SCHEMBL14798088 0.82 CA1 (0.35) TSHRCA12CA1CA2CA9
SCHEMBL19874475 0.77 CA12 (0.44) TSHRCA12CA1CA2CA9
SCHEMBL19874527 0.77 CA12 (0.44) TSHRCA12CA1CA2CA9
SCHEMBL14798157 0.77 CA2 (0.34) TSHRCA1CA2SMN1; SMN2LMNA
SCHEMBL14798412 0.74 TSHR (0.42) TSHRCA12CA1CA2CA9
SCHEMBL14805176 0.74 CA12 (0.54) CA12CA1CA2CA9CA7
SCHEMBL8361979 0.73 TDP1 (0.46) TSHRCA12CA1CA2CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9291908-B2 Method of forming pattern and laminate KABUSHIKI KAISHA TOSHIBA (JP) 2016-03-22 — — US disclosed
US-20150261092-A1 METHOD OF FORMING PATTERN AND LAMINATE KABUSHIKI KAISHA TOSHIBA (JP) 2015-09-17 — — US disclosed
US-9073284-B2 Method of forming pattern and laminate KABUSHIKI KAISHA TOSHIBA (JP) 2015-07-07 — — US disclosed
US-20130078570-A1 METHOD OF FORMING PATTERN AND LAMINATE TOSHIBA MEMORY CORPORATION (JP) 2013-03-28 — — US disclosed
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