SCHEMBL14798577

SCHEMBL14798577

[N-]=[N+]=NS(=O)(=O)c1ccc(CCC[Si](O)(O)O)cc1

nearest known ligand 0.39

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CA2 P00918 10/20 0.39
CA9 Q16790 3/20 0.39
BCL2L1 Q07817 3/20 0.35
BAK1 Q16611 3/20 0.35
SMN1; SMN2 Q16637 1/20 0.34
CA1 P00915 4/20 0.34
CA12 O43570 2/20 0.34
MGLL Q99685 2/20 0.33
CA4 P22748 1/20 0.33
CA6 P23280 1/20 0.33
CA5A P35218 1/20 0.33
CA7 P43166 1/20 0.33
CA14 Q9ULX7 1/20 0.33
CA5B Q9Y2D0 1/20 0.33
PDPK1 O15530 1/20 0.32
PTPN2 P17706 1/20 0.30
PTPN1 P18031 1/20 0.30
PTPN6 P29350 1/20 0.30
PTPN11 Q06124 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14798250 0.89 CA2 (0.37) CA2CA9BCL2L1BAK1SMN1; SMN2
SCHEMBL14797979 0.85 CA2 (0.36) CA2CA9BCL2L1BAK1SMN1; SMN2
SCHEMBL6014622 0.84 CA2 (0.45) CA2CA9BCL2L1BAK1SMN1; SMN2
SCHEMBL14798632 0.83 CA2 (0.36) CA2CA9BCL2L1BAK1SMN1; SMN2
SCHEMBL14798240 0.82 BCL2L1 (0.35) CA2CA9BCL2L1BAK1SMN1; SMN2
SCHEMBL14798246 0.81 CA2 (0.34) CA2CA9BCL2L1BAK1SMN1; SMN2
SCHEMBL11595972 0.80 CA2 (0.56) CA2CA9SMN1; SMN2CA1CA12
SCHEMBL17704474 0.80 MAOB (0.42) CA2BCL2L1BAK1CA1CA12
SCHEMBL14798639 0.80 CA12 (0.38) CA2CA9SMN1; SMN2CA1CA12
SCHEMBL17076870 0.80 CA2 (0.36) CA2CA9BCL2L1BAK1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9291908-B2 Method of forming pattern and laminate KABUSHIKI KAISHA TOSHIBA (JP) 2016-03-22 US disclosed
US-20150261092-A1 METHOD OF FORMING PATTERN AND LAMINATE KABUSHIKI KAISHA TOSHIBA (JP) 2015-09-17 US disclosed
US-9073284-B2 Method of forming pattern and laminate KABUSHIKI KAISHA TOSHIBA (JP) 2015-07-07 US disclosed
US-20130078570-A1 METHOD OF FORMING PATTERN AND LAMINATE TOSHIBA MEMORY CORPORATION (JP) 2013-03-28 US disclosed