SCHEMBL14798246

SCHEMBL14798246

CO[Si](C)(C)CCCc1ccc(S(=O)(=O)N=[N+]=[N-])cc1

nearest known ligand 0.38

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
CA2 P00918 6/20 0.34
SMN1; SMN2 Q16637 3/20 0.34
CA9 Q16790 1/20 0.33
BCL2L1 Q07817 2/20 0.33
BAK1 Q16611 2/20 0.33
ALDH1A1 P00352 1/20 0.31
PDPK1 O15530 1/20 0.30
LMNA P02545 1/20 0.30
TSHR P16473 1/20 0.30
HTT P42858 1/20 0.30
KDM4E B2RXH2 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14798240 0.88 BCL2L1 (0.35) CA2SMN1; SMN2CA9BCL2L1BAK1
SCHEMBL14798409 0.87 CA2 (0.35) CA2SMN1; SMN2CA9BCL2L1BAK1
SCHEMBL14798576 0.85 CA2 (0.37) CA2SMN1; SMN2CA9BCL2L1BAK1
SCHEMBL14798250 0.84 CA2 (0.37) CA2SMN1; SMN2CA9BCL2L1BAK1
SCHEMBL14798632 0.84 CA2 (0.36) CA2SMN1; SMN2CA9BCL2L1BAK1
SCHEMBL14798242 0.83 CA1 (0.38) CA2SMN1; SMN2CA9BCL2L1BAK1
SCHEMBL7626006 0.82 BCL2L1 (0.36) CA2SMN1; SMN2CA9BCL2L1BAK1
SCHEMBL14798577 0.81 CA2 (0.39) CA2SMN1; SMN2CA9BCL2L1BAK1
SCHEMBL14797979 0.81 CA2 (0.36) CA2SMN1; SMN2CA9BCL2L1BAK1
SCHEMBL17076870 0.81 CA2 (0.36) CA2SMN1; SMN2CA9BCL2L1BAK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9291908-B2 Method of forming pattern and laminate KABUSHIKI KAISHA TOSHIBA (JP) 2016-03-22 US disclosed
US-20150261092-A1 METHOD OF FORMING PATTERN AND LAMINATE KABUSHIKI KAISHA TOSHIBA (JP) 2015-09-17 US disclosed
US-9073284-B2 Method of forming pattern and laminate KABUSHIKI KAISHA TOSHIBA (JP) 2015-07-07 US disclosed
US-20130078570-A1 METHOD OF FORMING PATTERN AND LAMINATE TOSHIBA MEMORY CORPORATION (JP) 2013-03-28 US disclosed