SCHEMBL14798240

SCHEMBL14798240

CO[Si](CCCc1ccc(S(=O)(=O)N=[N+]=[N-])cc1)(OC)OC

nearest known ligand 0.36

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
BCL2L1 Q07817 2/20 0.35
BAK1 Q16611 2/20 0.35
CA2 P00918 8/20 0.35
SMN1; SMN2 Q16637 2/20 0.35
ALDH1A1 P00352 6/20 0.34
CA9 Q16790 4/20 0.34
CA1 P00915 3/20 0.32
CA12 O43570 2/20 0.32
LMNA P02545 1/20 0.32
KMT2A Q03164 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7626006 0.92 BCL2L1 (0.36) BCL2L1BAK1CA2SMN1; SMN2ALDH1A1
SCHEMBL14798246 0.88 CA2 (0.34) BCL2L1BAK1CA2SMN1; SMN2ALDH1A1
SCHEMBL17076870 0.87 CA2 (0.36) BCL2L1BAK1CA2SMN1; SMN2CA9
SCHEMBL14798581 0.85 CA2 (0.38) BCL2L1BAK1CA2SMN1; SMN2CA9
SCHEMBL14798582 0.83 TSHR (0.39) BCL2L1BAK1CA2SMN1; SMN2ALDH1A1
SCHEMBL14798250 0.82 CA2 (0.37) BCL2L1BAK1CA2SMN1; SMN2CA9
SCHEMBL14798632 0.82 CA2 (0.36) BCL2L1BAK1CA2SMN1; SMN2CA9
SCHEMBL10348124 0.82 CA2 (0.33) BCL2L1BAK1CA2SMN1; SMN2ALDH1A1
SCHEMBL14798577 0.82 CA2 (0.39) BCL2L1BAK1CA2SMN1; SMN2CA9
SCHEMBL14797979 0.82 CA2 (0.36) BCL2L1BAK1CA2SMN1; SMN2CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9291908-B2 Method of forming pattern and laminate KABUSHIKI KAISHA TOSHIBA (JP) 2016-03-22 US disclosed
US-20150261092-A1 METHOD OF FORMING PATTERN AND LAMINATE KABUSHIKI KAISHA TOSHIBA (JP) 2015-09-17 US disclosed
US-9073284-B2 Method of forming pattern and laminate KABUSHIKI KAISHA TOSHIBA (JP) 2015-07-07 US disclosed
US-20130078570-A1 METHOD OF FORMING PATTERN AND LAMINATE TOSHIBA MEMORY CORPORATION (JP) 2013-03-28 US disclosed