SCHEMBL14825628

SCHEMBL14825628

C=C(C)C(=O)OC(C)(c1ccco1)C1Cc2ccccc2C1

nearest known ligand 0.33

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
MAPT P10636 3/20 0.33
NPC1 O15118 1/20 0.32
RAB9A P51151 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
FAAH O00519 1/20 0.32
KDM4E B2RXH2 2/20 0.31
MEN1 O00255 2/20 0.31
ALDH1A1 P00352 2/20 0.31
KMT2A Q03164 2/20 0.31
TDP1 Q9NUW8 1/20 0.31
POLB P06746 1/20 0.30
PKM P14618 1/20 0.30
ALOX12 P18054 1/20 0.30
HTT P42858 1/20 0.30
NPSR1 Q6W5P4 1/20 0.30
L3MBTL1 Q9Y468 1/20 0.30
MTNR1A P48039 1/20 0.30
MTNR1B P49286 1/20 0.30
ELANE P08246 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14825618 0.80 ELANE (0.36) MAPTSMN1; SMN2KDM4EALDH1A1KMT2A
SCHEMBL14825626 0.79 ADORA2B (0.32)
SCHEMBL75128 0.77 MAPT (0.41) MAPTNPC1RAB9ASMN1; SMN2KDM4E
SCHEMBL14825595 0.77 MTNR1A (0.36) KDM4EMEN1ALDH1A1KMT2ATDP1
SCHEMBL14825606 0.76 MTNR1A (0.37) FAAHKDM4EALDH1A1TDP1MTNR1A
SCHEMBL14825625 0.75 CHRM3 (0.33) MAPTMEN1ALDH1A1KMT2A
SCHEMBL75369 0.74 MAPT (0.35) MAPTKDM4EMEN1ALDH1A1KMT2A
SCHEMBL14825627 0.74
SCHEMBL14825602 0.74 MTNR1A (0.35) MTNR1AMTNR1BELANE
SCHEMBL14825603 0.74 MTNR1A (0.35) ALDH1A1MTNR1AMTNR1BELANE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8574817-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-11-05 US disclosed
US-8574817-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-11-05 US disclosed
US-20130084529-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-04-04 US disclosed
US-20130084529-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-04-04 US disclosed