SCHEMBL14825618

SCHEMBL14825618

C=C(C)C(=O)OC(C)(c1ccccc1)C1Cc2ccccc2C1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 1/20 0.36
CYP2C19 P33261 1/20 0.36
HIF1A Q16665 1/20 0.36
MTNR1A P48039 1/20 0.33
MTNR1B P49286 1/20 0.33
SSTR4 P31391 1/20 0.33
KDM4E B2RXH2 1/20 0.33
ALDH1A1 P00352 1/20 0.33
MAPT P10636 1/20 0.33
KMT2A Q03164 1/20 0.33
CHRM3 P20309 4/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
KEAP1 Q14145 1/20 0.33
NFE2L2 Q16236 1/20 0.33
KCNN4 O15554 1/20 0.33
LMNA P02545 1/20 0.32
GRM7 Q14831 2/20 0.32
ATM Q13315 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
HDAC3 O15379 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14825627 0.84
SCHEMBL14825626 0.84 ADORA2B (0.32)
SCHEMBL14825595 0.82 MTNR1A (0.36) ELANEMTNR1AMTNR1BKDM4EALDH1A1
SCHEMBL14825625 0.80 CHRM3 (0.33) ALDH1A1MAPTKMT2ACHRM3
SCHEMBL14825628 0.80 MAPT (0.33) ELANEMTNR1AMTNR1BKDM4EALDH1A1
SCHEMBL14825606 0.78 MTNR1A (0.37) ELANEMTNR1AMTNR1BKDM4EALDH1A1
SCHEMBL14825615 0.77 HRH3 (0.35) ELANECYP2C19MTNR1AMTNR1BKDM4E
SCHEMBL14825624 0.77 RIPK1 (0.35) ELANEMTNR1AMTNR1BKDM4EALDH1A1
SCHEMBL3180129 0.76 CYP2C19 (0.46) ELANECYP2C19HIF1AKDM4EALDH1A1
SCHEMBL14825612 0.76 MTNR1A (0.44) MTNR1AMTNR1B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8574817-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-11-05 US disclosed
US-8574817-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-11-05 US disclosed
US-20130084529-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-04-04 US disclosed
US-20130084529-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-04-04 US disclosed