Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 3/20 | 0.64 |
| ▸ | PLK1 | P53350 | 2/20 | 0.62 |
| ▸ | THRB | P10828 | 3/20 | 0.60 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.60 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.58 |
| ▸ | LMNA | P02545 | 2/20 | 0.55 |
| ▸ | POLB | P06746 | 3/20 | 0.55 |
| ▸ | CTDSP1 | Q9GZU7 | 3/20 | 0.55 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.55 |
| ▸ | GAA | P10253 | 2/20 | 0.55 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.55 |
| ▸ | NPC1 | O15118 | 2/20 | 0.53 |
| ▸ | RAB9A | P51151 | 2/20 | 0.53 |
| ▸ | MAPT | P10636 | 1/20 | 0.53 |
| ▸ | ESR1 | P03372 | 1/20 | 0.51 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.51 |
| ▸ | THRA | P10827 | 2/20 | 0.49 |
| ▸ | MMP12 | P39900 | 1/20 | 0.49 |
| ▸ | MMP13 | P45452 | 1/20 | 0.49 |
| ▸ | RARB | P10826 | 1/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9406602 | 0.94 | RARB (0.58) | KMT2APLK1THRBHSD17B10L3MBTL1 | |
| SCHEMBL25175254 | 0.89 | MAPT (0.68) | KMT2APLK1THRBHSD17B10L3MBTL1 | |
| SCHEMBL9818052 | 0.88 | KMT2A (0.73) | KMT2APLK1HSD17B10L3MBTL1LMNA | |
| SCHEMBL967078 | 0.87 | HSD17B10 (0.67) | KMT2APLK1THRBHSD17B10POLB | |
| SCHEMBL18477943 | 0.86 | L3MBTL1 (0.66) | KMT2AL3MBTL1LMNAPOLBALDH1A1 | |
| SCHEMBL4122562 | 0.86 | MAPT (0.62) | KMT2APLK1LMNAPOLBALDH1A1 | |
| SCHEMBL963847 | 0.85 | THRA (0.67) | KMT2ATHRBHSD17B10ALDH1A1MAPT | |
| SCHEMBL5339874 | 0.84 | TRPV1 (0.61) | KMT2APLK1LMNAPOLBCTDSP1 | |
| SCHEMBL11424105 | 0.84 | HSD17B10 (0.74) | KMT2APLK1THRBHSD17B10L3MBTL1 | |
| SCHEMBL17457887 | 0.84 | HSD17B10 (0.74) | KMT2ATHRBHSD17B10L3MBTL1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 206 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119039135-A | Carboxyl chalcone derivative and preparation method and application thereof | 四川大学 | 2024-11-29 | — | — | CN | claimed |
| CN-117304135-A | Synthesis method of 4-substituted-5H-1, 2, 3-dithiazole-5-thione and derivative | 衡阳师范学院 | 2023-12-29 | — | — | CN | claimed |
| CN-116178365-A | Berberine hydrochloride derivative and preparation method and application thereof | 常州大学 | 2023-05-30 | — | — | CN | claimed |
| CN-114276308-A | Magnetic resonance contrast agent and preparation method and application thereof | 南京科技职业学院 | 2022-04-05 | — | — | CN | claimed |
| CN-119930469-A | Chalcone compound containing alpha, beta-unsaturated hydroxamic acid groups and preparation method and application thereof | 河北医科大学 | 2025-05-06 | — | — | CN | disclosed |
| CN-116178365-B | Berberine hydrochloride derivative and preparation method and application thereof | 常州大学 | 2025-04-08 | — | — | CN | disclosed |
| CN-119039135-A | Carboxyl chalcone derivative and preparation method and application thereof | 四川大学 | 2024-11-29 | — | — | CN | disclosed |
| CN-118546054-A | Method for preparing alpha-deuterated ketone compound by photocatalysis and application thereof | 武汉大学 | 2024-08-27 | — | — | CN | disclosed |
| CN-112218844-B | Compound, resin, composition, resist pattern forming method, circuit pattern forming method, and resin purifying method | 三菱瓦斯化学株式会社 | 2024-04-26 | — | — | CN | disclosed |
| CN-115968391-B | Composition, resin, method for producing amorphous film, method for forming resist pattern, method for producing underlayer film for lithography, and method for forming circuit pattern | 三菱瓦斯化学株式会社 | 2024-04-26 | — | — | CN | disclosed |
| CN-115975695-B | Lubricating oil composition capable of realizing wide Wen Yuchao sliding | 武汉理工大学 | 2024-04-16 | — | — | CN | disclosed |
| US-20240117101-A1 | COMPOSITION FOR FILM FORMATION, RESIST COMPOSITION, RADIATION-SENSITIVE COMPOSITION, METHOD FOR PRODUCING AMORPHOUS FILM, RESIST PATTERN FORMATION METHOD, COMPOSITION FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY, METHOD FOR PRODUCING UNDERLAYER FILM FOR LITHOGRAPHY, CIRCUIT PATTERN FORMATION METHOD, COMPOSITION FOR OPTICAL MEMBER FORMATION, RESIN FOR UNDERLAYER FILM FORMATION, RESIST RESIN, RADIATION-SENSITIVE RESIN, AND RESIN FOR UNDERLAYER FILM FORMATION FOR LITHOGRAPHY | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2024-04-11 | — | — | US | disclosed |
| CN-86105663-A | Compound | — | 1987-01-21 | — | — | CN | disclosed |
| EP-0208517-A2 | 6-Oxo-pyridazinyl compounds | SMITH KLINE & FRENCH LABORATORIES LIMITED (GB) | 1987-01-14 | — | — | EP | disclosed |
| EP-0170082-A2 | Liquid crystalline isothiocyanates with a dioxane ring and liquid crystalline admixtures containing the same | Wojskowa Akademia Techniczna im. Jaroslawa Dabrowskiego (PL) | 1986-02-05 | — | — | EP | disclosed |
| EP-0136480-A2 | 2,3-Dicyano-5-substituted pyrazines and liquid crystal composition containing them | Chisso Corporation (JP) | 1985-04-10 | — | — | EP | disclosed |
| US-4438277-A | Hydronaphthalene derivatives | SANKYO COMPANY, LIMITED (JP) | 1984-03-20 | — | — | US | disclosed |
| US-4361515-A | Antihyperlipemic dihydro-ML-236B derivatives, their preparation and use | SANKYO COMPANY, LIMITED (JP) | 1982-11-30 | — | — | US | disclosed |
| US-4261651-A | CYCLOHEXANE CONTAINING DERIVATIVES OF AROMATIC NITRILES | THE SECRETARY OF STATE FOR DEFENCE IN HER BRITANNIC MAJESTY'S GOVERNMENT OF THE UNITED KINGDOM OF GREAT BRITAIN AND NORTHERN IRELAND (GB) | 1981-04-14 | — | — | US | disclosed |
| US-3971825-A | (5,6) (10,11) BIS-METHYLENE, BRONCHODILATORS | SANKYO COMPANY LIMITED (JA) | 1976-07-27 | — | — | US | disclosed |