Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.51 |
| ▸ | KDM4E | B2RXH2 | 5/20 | 0.51 |
| ▸ | HPGD | P15428 | 4/20 | 0.51 |
| ▸ | GAA | P10253 | 4/20 | 0.51 |
| ▸ | GLA | P06280 | 3/20 | 0.51 |
| ▸ | POLB | P06746 | 3/20 | 0.51 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.51 |
| ▸ | LMNA | P02545 | 2/20 | 0.51 |
| ▸ | RAB9A | P51151 | 2/20 | 0.51 |
| ▸ | NPC1 | O15118 | 1/20 | 0.51 |
| ▸ | PTBP1 | P26599 | 1/20 | 0.51 |
| ▸ | RCE1 | Q9Y256 | 1/20 | 0.51 |
| ▸ | MAPT | P10636 | 1/20 | 0.47 |
| ▸ | ACHE | P22303 | 1/20 | 0.47 |
| ▸ | RAD52 | P43351 | 2/20 | 0.41 |
| ▸ | MITF | O75030 | 1/20 | 0.41 |
| ▸ | TTR | P02766 | 1/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | IDO1 | P14902 | 1/20 | 0.39 |
| ▸ | TOP2A | P11388 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30376957 | 1.00 | ALDH1A1 (0.51) | ALDH1A1KDM4EHPGDGAAGLA | |
| SCHEMBL23421423 | 0.89 | KMT2A (0.58) | ALDH1A1KDM4EHPGDGAAGLA | |
| SCHEMBL29631756 | 0.89 | KMT2A (0.58) | ALDH1A1KDM4EHPGDGAAGLA | |
| SCHEMBL6432006 | 0.87 | ALDH1A1 (0.46) | ALDH1A1KDM4EHPGDGAAGLA | |
| SCHEMBL31574332 | 0.86 | ALDH1A1 (0.55) | ALDH1A1KDM4EHPGDGAAGLA | |
| SCHEMBL22497413 | 0.86 | ALDH1A1 (0.55) | ALDH1A1KDM4EHPGDGAAGLA | |
| SCHEMBL9936015 | 0.86 | ALDH1A1 (0.55) | ALDH1A1KDM4EHPGDGAAGLA | |
| SCHEMBL29629266 | 0.84 | ALDH1A1 (0.53) | ALDH1A1KDM4EHPGDGAAGLA | |
| SCHEMBL30434810 | 0.84 | ALDH1A1 (0.53) | ALDH1A1KDM4EHPGDGAAGLA | |
| SCHEMBL28491074 | 0.84 | ALDH1A1 (0.53) | ALDH1A1KDM4EHPGDGAAGLA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111777556-B | Method for preparing acridine 9-carboxylic acid by oxidation method | 遂成药业股份有限公司 | 2022-08-19 | — | — | CN | disclosed |
| CN-111562720-A | Photosensitizing chemically amplified resist material, method for forming pattern, semiconductor device, mask for lithography, and template for nanoimprint | 东京毅力科创株式会社 | 2020-08-21 | — | — | CN | disclosed |
| CN-106030417-B | Photosensitizing chemically amplified resist material, method for forming pattern using same, semiconductor device, mask for lithography, and method for manufacturing template for nanoimprinting | 东京毅力科创株式会社 | 2020-02-28 | — | — | CN | disclosed |
| EP-1580598-B1 | Positive resist composition for immersion exposure and pattern-forming method using the same | FUJIFILM CORP (JP) | 2016-10-12 | — | — | EP | disclosed |
| US-9023576-B2 | Positive resist composition for immersion exposure and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2015-05-05 | — | — | US | disclosed |
| US-20110076622-A1 | POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN-FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-03-31 | — | — | US | disclosed |
| US-7906268-B2 | Positive resist composition for immersion exposure and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2011-03-15 | — | — | US | disclosed |
| EP-1580598-A2 | Positive resist composition for immersion exposure and pattern-forming method using the same | Fuji Photo Film Co. Ltd. (JP) | 2005-09-28 | — | — | EP | disclosed |
| US-20050208419-A1 | Fluoropolymer containing unsaturated monomer with a adamantyl, decalin, norbornyl, cedrol , cyclohexyl, cycloheptyl, cyclooctyl , a cyclodecanyl, cyclododecanyl and/or tricyclodecanyl group; sulfonium type compound generates acid upon exposure to actinic radiation; semiconductor, integrated circuits | FUJI PHOTO FILM CO., LTD. | 2005-09-22 | — | — | US | disclosed |
| US-5193024-A | Forming bubbles in a dye solution within a cell and focusing a beam from a laser, vaporization solvent and illumination of solution | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1993-03-09 | — | — | US | disclosed |