SCHEMBL14848425

SCHEMBL14848425

C=C(C)C(=O)OCCOC1c2ccccc2C(=O)c2ccccc21

nearest known ligand 0.46

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.40
EDNRB P24530 3/20 0.38
EDNRA P25101 3/20 0.38
POLB P06746 2/20 0.36
APEX1 P27695 1/20 0.36
HTT P42858 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
CYP1A2 P05177 1/20 0.36
TSHR P16473 3/20 0.36
CA1 P00915 2/20 0.35
CA2 P00918 2/20 0.35
MTNR1A P48039 1/20 0.34
MTNR1B P49286 1/20 0.34
RET P07949 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14848394 0.84 THRB (0.35) THRBPOLBAPEX1HTTTDP1
SCHEMBL9610534 0.81 POLB (0.46) EDNRBEDNRAPOLBCYP1A2
SCHEMBL9610532 0.80 POLB (0.38) EDNRBEDNRAPOLBCYP1A2MTNR1A
SCHEMBL8063412 0.77 POLB (0.40) THRBPOLBAPEX1HTTTDP1
SCHEMBL11481881 0.76 CDC25B (0.41) EDNRBEDNRAPOLBTDP1CYP1A2
SCHEMBL16545315 0.76 THRB (0.42) THRBPOLBAPEX1HTTTDP1
SCHEMBL16660467 0.75 ELANE (0.47) THRBPOLBAPEX1HTTTDP1
SCHEMBL13515784 0.73 GAA (0.57) THRBPOLBAPEX1HTTTDP1
SCHEMBL16858730 0.73 THRB (0.40) THRBPOLBAPEX1HTTTDP1
SCHEMBL16652777 0.73 POLB (0.39) THRBPOLBAPEX1HTTTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9023586-B2 Positive resist composition and patterning process using same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-05-05 US disclosed
US-9023586-B2 Positive resist composition and patterning process using same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-05-05 US disclosed
US-8846303-B2 Resist top coat composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-30 US disclosed
US-8846303-B2 Resist top coat composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-30 US disclosed
US-20140170563-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-06-19 US disclosed
US-20140170563-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-06-19 US disclosed
US-20130089820-A1 RESIST TOP COAT COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-04-11 US disclosed
US-20130089820-A1 RESIST TOP COAT COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-04-11 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20130089820-A1 RESIST TOP COAT COMPOSITION AND PATTERNING PROCESS PSMB2, PSMC6, PSMB1 THRB 323/4885EDNRB 725/4885EDNRA 2270/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.