SCHEMBL14865717

SCHEMBL14865717

C=C(C)C(=O)OC(CC)C(F)(F)C(C)=O

nearest known ligand 0.36

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.36
ALDH1A1 P00352 1/20 0.34
THRB P10828 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL439029 0.88 TSHR (0.35) TSHRALDH1A1THRB
SCHEMBL864197 0.86 TSHR (0.34) TSHRALDH1A1THRB
SCHEMBL9987218 0.86 TSHR (0.34) TSHRALDH1A1THRB
SCHEMBL864176 0.85 TSHR (0.32) TSHRTHRB
SCHEMBL8375972 0.85 TSHR (0.38) TSHRALDH1A1THRB
SCHEMBL4568746 0.85 ALDH1A1 (0.39) TSHRALDH1A1THRB
SCHEMBL22841006 0.85 ALDH1A1 (0.39) TSHRALDH1A1THRB
SCHEMBL12856941 0.84 TSHR (0.37) TSHRALDH1A1THRB
SCHEMBL47314 0.83 THRB (0.38) TSHRALDH1A1THRB
SCHEMBL20924877 0.83 TSHR (0.33) TSHRALDH1A1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9957339-B2 Copolymer and associated layered article, and device-forming method ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2018-05-01 US disclosed
US-9815930-B2 Block copolymer and associated photoresist composition and method of forming an electronic device ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2017-11-14 US disclosed
US-20170037178-A1 BLOCK COPOLYMER AND ASSOCIATED PHOTORESIST COMPOSITION AND METHOD OF FORMING AN ELECTRONIC DEVICE THE UNIVERSITY OF QUEENSLAND (AU) 2017-02-09 US disclosed
US-20170037171-A1 COPOLYMER AND ASSOCIATED LAYERED ARTICLE, AND DEVICE-FORMING METHOD THE UNIVERSITY OF QUEENSLAND (AU) 2017-02-09 US disclosed
US-9182669-B2 Copolymer with acid-labile group, photoresist composition, coated substrate, and method of forming an electronic device ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2015-11-10 US disclosed
US-9122154-B2 Radiation-sensitive resin composition, and radiation-sensitive acid generating agent JSR CORPORATION (JP) 2015-09-01 US disclosed
US-20150177614-A1 COPOLYMER WITH ACID-LABILE GROUP, PHOTORESIST COMPOSITION, COATED SUBSTRATE, AND METHOD OF FORMING AN ELECTRONIC DEVICE U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2015-06-25 US disclosed
US-8889336-B2 Radiation-sensitive resin composition and radiation-sensitive acid generating agent JSR CORPORATION (JP) 2014-11-18 US disclosed
US-20140154625-A9 RADIATION-SENSITIVE RESIN COMPOSITION, AND RADIATION-SENSITIVE ACID GENERATING AGENT JSR CORPORATION (JP) 2014-06-05 US disclosed
US-20130295505-A1 RADIATION-SENSITIVE RESIN COMPOSITION, AND RADIATION-SENSITIVE ACID GENERATING AGENT JSR CORP (JP) 2013-11-07 US disclosed
US-20130260316-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND RADIATION-SENSITIVE ACID GENERATING AGENT JSR CORPORATION (JP) 2013-10-03 US disclosed
US-20130095428-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2013-04-18 US disclosed