SCHEMBL864197

SCHEMBL864197

C=C(C)C(=O)OC(CC)C(F)(F)C(=O)Cl

nearest known ligand 0.34

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.34
THRB P10828 1/20 0.33
ALDH1A1 P00352 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14865717 0.86 TSHR (0.36) TSHRTHRBALDH1A1
SCHEMBL439029 0.85 TSHR (0.35) TSHRTHRBALDH1A1
SCHEMBL9987218 0.83 TSHR (0.34) TSHRTHRBALDH1A1
SCHEMBL8375972 0.82 TSHR (0.38) TSHRTHRBALDH1A1
SCHEMBL22841006 0.82 ALDH1A1 (0.39) TSHRTHRBALDH1A1
SCHEMBL4568746 0.82 ALDH1A1 (0.39) TSHRTHRBALDH1A1
SCHEMBL12856941 0.81 TSHR (0.37) TSHRTHRBALDH1A1
SCHEMBL20924877 0.81 TSHR (0.33) TSHRTHRBALDH1A1
SCHEMBL47314 0.81 THRB (0.38) TSHRTHRBALDH1A1
SCHEMBL14732671 0.81 TSHR (0.33) TSHRTHRBALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8663897-B2 Fluorine-containing sulfonates having polymerizable anions and manufacturing method therefor, fluorine-containing resins, resist compositions, and pattern-forming method using same CENTRAL GLASS COMPANY, LIMITED (JP) 2014-03-04 US disclosed
US-8663897-B2 Fluorine-containing sulfonates having polymerizable anions and manufacturing method therefor, fluorine-containing resins, resist compositions, and pattern-forming method using same CENTRAL GLASS COMPANY, LIMITED (JP) 2014-03-04 US disclosed
US-8663897-B2 Fluorine-containing sulfonates having polymerizable anions and manufacturing method therefor, fluorine-containing resins, resist compositions, and pattern-forming method using same CENTRAL GLASS COMPANY, LIMITED (JP) 2014-03-04 US disclosed
US-8592540-B2 Fluorine-containing compound, fluorine-containing polymer compound, resist composition and patterning method using same CENTRAL GLASS COMPANY, LIMITED (JP) 2013-11-26 US disclosed
US-20120077126-A1 Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition, Top Coat Composition And Pattern Formation Method CENTRAL GLASS COMPANY, LIMITED (JP) 2012-03-29 US disclosed
US-20120077126-A1 Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition, Top Coat Composition And Pattern Formation Method CENTRAL GLASS COMPANY, LIMITED (JP) 2012-03-29 US disclosed
US-20120077126-A1 Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition, Top Coat Composition And Pattern Formation Method CENTRAL GLASS COMPANY, LIMITED (JP) 2012-03-29 US disclosed
US-20110318542-A1 Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition and Patterning Method Using Same CENTRAL GLASS COMPANY, LIMITED (JP) 2011-12-29 US disclosed
US-20110318542-A1 Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition and Patterning Method Using Same CENTRAL GLASS COMPANY, LIMITED (JP) 2011-12-29 US disclosed
US-20110318542-A1 Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition and Patterning Method Using Same CENTRAL GLASS COMPANY, LIMITED (JP) 2011-12-29 US disclosed
US-20110177453-A1 Fluorine-Containing Sulfonates Having Polymerizable Anions and Manufacturing Method Therefor, Fluorine-Containing Resins, Resist Compositions, and Pattern-Forming Method Using Same CENTRAL GLASS COMPANY, LIMITED (JP) 2011-07-21 US disclosed
US-20110177453-A1 Fluorine-Containing Sulfonates Having Polymerizable Anions and Manufacturing Method Therefor, Fluorine-Containing Resins, Resist Compositions, and Pattern-Forming Method Using Same CENTRAL GLASS COMPANY, LIMITED (JP) 2011-07-21 US disclosed
US-20110177453-A1 Fluorine-Containing Sulfonates Having Polymerizable Anions and Manufacturing Method Therefor, Fluorine-Containing Resins, Resist Compositions, and Pattern-Forming Method Using Same CENTRAL GLASS COMPANY, LIMITED (JP) 2011-07-21 US disclosed
WO-2010140483-A1 FLUORINE-CONTAINING COMPOUND, FLUORINE-CONTAINING POLYMER COMPOUND, RESIST COMPOSITION, TOP COAT COMPOSITION AND PATTERN FORMATION METHOD セントラル硝子株式会社 (JP) 2010-12-09 WO disclosed
WO-2010044372-A1 FLUORINE-CONTAINING SULFONATES HAVING POLYMERIZABLE ANIONS AND MANUFACTURING METHOD THEREFOR, FLUORINE-CONTAINING RESINS, RESIST COMPOSITIONS, AND PATTERN-FORMING METHOD USING SAME セントラル硝子株式会社 (JP) 2010-04-22 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110177453-A1 Fluorine-Containing Sulfonates Having Polymerizable Anions and Manufacturing Method Therefor, Fluorine-Containing Resins, Resist Compositions, and Pattern-Forming Method Using Same WASF2, EEF2, IKZF2 TSHR 2715/4885THRB 3531/4885ALDH1A1 2304/4885
US-20120077126-A1 Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition, Top Coat Composition And Pattern Formation Method FRG1, AFF2, FBXL19 TSHR 2270/4885THRB 3872/4885ALDH1A1 4430/4885
US-20110318542-A1 Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition and Patterning Method Using Same FRG1, AFF2, AFF1 TSHR 1374/4885THRB 3349/4885ALDH1A1 2738/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.