SCHEMBL14866819

SCHEMBL14866819

CCC(C)c1ccc(COCc2c(F)c(F)c(C(F)(F)F)c(F)c2F)cc1

nearest known ligand 0.47

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 3/20 0.47
▸ NPC1 O15118 2/20 0.34
▸ RAB9A P51151 2/20 0.34
▸ HSP90AA1 P07900 1/20 0.33
▸ L3MBTL1 Q9Y468 1/20 0.33
▸ TSHR P16473 1/20 0.32
▸ IDO1 P14902 2/20 0.31
▸ ESR1 P03372 1/20 0.31
▸ ESR2 Q92731 1/20 0.31
▸ AR P10275 1/20 0.31
▸ ALOX5 P09917 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14866841 0.89 NPC1 (0.38) ALDH1A1NPC1RAB9AHSP90AA1L3MBTL1
SCHEMBL14866852 0.82 ALDH1A1 (0.60) ALDH1A1NPC1RAB9AHSP90AA1L3MBTL1
SCHEMBL14866805 0.74 ALDH1A1 (0.50) ALDH1A1TSHR
SCHEMBL25491996 0.73 NPC1 (0.41) ALDH1A1NPC1RAB9AHSP90AA1L3MBTL1
SCHEMBL10178438 0.73 TSHR (0.56) ALDH1A1NPC1RAB9ATSHRIDO1
SCHEMBL10178545 0.72 NPC1 (0.43) ALDH1A1NPC1RAB9AHSP90AA1L3MBTL1
SCHEMBL17853795 0.70 NPC1 (0.41) ALDH1A1NPC1RAB9AHSP90AA1L3MBTL1
SCHEMBL25491995 0.70 NPC1 (0.40) ALDH1A1NPC1RAB9AHSP90AA1L3MBTL1
SCHEMBL19821740 0.70 NPC1 (0.40) ALDH1A1NPC1RAB9AHSP90AA1L3MBTL1
SCHEMBL19821739 0.70 NPC1 (0.41) ALDH1A1NPC1RAB9AHSP90AA1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9034558-B2 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern FUJIFILM CORPORATION (JP) 2015-05-19 — — US disclosed
US-20130115557-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN FUJIFILM CORPORATION (JP) 2013-05-09 — — US disclosed
US-20130095429-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME FUJIFILM CORPORATION (JP) 2013-04-18 — — US disclosed
Send feedback