Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.56 |
| ▸ | NPC1 | O15118 | 2/20 | 0.44 |
| ▸ | RAB9A | P51151 | 2/20 | 0.44 |
| ▸ | BCHE | P06276 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.44 |
| ▸ | SLC7A5 | Q01650 | 1/20 | 0.42 |
| ▸ | TACR1 | P25103 | 2/20 | 0.42 |
| ▸ | ESR1 | P03372 | 1/20 | 0.40 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.40 |
| ▸ | IDO1 | P14902 | 1/20 | 0.40 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11922946 | 0.85 | ALDH1A1 (0.53) | TSHRNPC1RAB9ABCHEALDH1A1 | |
| SCHEMBL10178545 | 0.85 | NPC1 (0.43) | TSHRNPC1RAB9AALDH1A1ESR1 | |
| SCHEMBL10178628 | 0.84 | TSHR (0.50) | TSHRBCHETACR1ALOX5 | |
| SCHEMBL12895427 | 0.84 | TACR1 (0.43) | TSHRNPC1RAB9ABCHEALDH1A1 | |
| SCHEMBL23453300 | 0.84 | TAAR1 (0.62) | TSHRBCHETACR1ESR1ESR2 | |
| SCHEMBL13756779 | 0.82 | TSHR (0.62) | TSHRNPC1RAB9AALDH1A1TACR1 | |
| SCHEMBL6547015 | 0.82 | CALM1 (0.50) | TSHRNPC1RAB9AALDH1A1SLC7A5 | |
| SCHEMBL9842310 | 0.82 | TSHR (0.62) | TSHRNPC1RAB9AALDH1A1TACR1 | |
| SCHEMBL5665155 | 0.82 | MAOA (0.45) | TSHRNPC1RAB9AALDH1A1SLC7A5 | |
| SCHEMBL28572476 | 0.82 | BCHE (0.60) | TSHRNPC1RAB9ABCHEALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8124310-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20090087784-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |