SCHEMBL14866841

SCHEMBL14866841

CCC(C)c1ccc(COCc2c(F)c(F)c(F)c(F)c2F)cc1

nearest known ligand 0.46

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
▸ NPC1 O15118 2/20 0.38
▸ RAB9A P51151 2/20 0.38
▸ HSP90AA1 P07900 1/20 0.36
▸ L3MBTL1 Q9Y468 1/20 0.36
▸ ALDH1A1 P00352 5/20 0.36
▸ TSHR P16473 2/20 0.36
▸ IDO1 P14902 2/20 0.36
▸ ESR1 P03372 1/20 0.36
▸ ESR2 Q92731 1/20 0.36
▸ GAA P10253 2/20 0.33
▸ CYP2C9 P11712 1/20 0.33
▸ MAPT P10636 1/20 0.33
▸ USP2 O75604 1/20 0.33
▸ PKM P14618 1/20 0.33
▸ HPGD P15428 1/20 0.33
▸ ALOX15 P16050 1/20 0.33
▸ HSD17B10 Q99714 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14866819 0.89 ALDH1A1 (0.47) NPC1RAB9AHSP90AA1L3MBTL1ALDH1A1
SCHEMBL25491996 0.80 NPC1 (0.41) NPC1RAB9AHSP90AA1L3MBTL1ALDH1A1
SCHEMBL10178438 0.80 TSHR (0.56) NPC1RAB9AALDH1A1TSHRIDO1
SCHEMBL10178545 0.79 NPC1 (0.43) NPC1RAB9AHSP90AA1L3MBTL1ALDH1A1
SCHEMBL14866962 0.79 ALDH1A1 (0.41) NPC1RAB9AHSP90AA1L3MBTL1ALDH1A1
SCHEMBL14866953 0.79 ALDH1A1 (0.45) NPC1RAB9AHSP90AA1L3MBTL1ALDH1A1
SCHEMBL25491995 0.77 NPC1 (0.40) NPC1RAB9AHSP90AA1L3MBTL1ALDH1A1
SCHEMBL19821739 0.76 NPC1 (0.41) NPC1RAB9AHSP90AA1L3MBTL1ALDH1A1
SCHEMBL10178606 0.76 NPC1 (0.41) NPC1RAB9AHSP90AA1L3MBTL1ALDH1A1
SCHEMBL17885954 0.76 NPC1 (0.41) NPC1RAB9AHSP90AA1L3MBTL1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9034558-B2 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern FUJIFILM CORPORATION (JP) 2015-05-19 — — US disclosed
US-20130115557-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN FUJIFILM CORPORATION (JP) 2013-05-09 — — US disclosed
US-20130095429-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME FUJIFILM CORPORATION (JP) 2013-04-18 — — US disclosed
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