SCHEMBL14866953

SCHEMBL14866953

CCC(C)c1ccc(COc2c(F)c(F)c(F)c(F)c2F)cc1

nearest known ligand 0.47

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 3/20 0.45
▸ NPC1 O15118 2/20 0.42
▸ RAB9A P51151 2/20 0.42
▸ TSHR P16473 1/20 0.41
▸ L3MBTL1 Q9Y468 2/20 0.40
▸ HSP90AA1 P07900 1/20 0.40
▸ TDP1 Q9NUW8 2/20 0.39
▸ POLB P06746 1/20 0.39
▸ MAPT P10636 1/20 0.39
▸ IDO1 P14902 2/20 0.37
▸ ESR1 P03372 1/20 0.37
▸ ESR2 Q92731 1/20 0.37
▸ BCHE P06276 1/20 0.35
▸ RXRA P19793 1/20 0.35
▸ RXRB P28702 1/20 0.35
▸ MEN1 O00255 1/20 0.35
▸ KMT2A Q03164 1/20 0.35
▸ CYP2C9 P11712 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14866852 0.88 ALDH1A1 (0.60) ALDH1A1NPC1RAB9ATSHRL3MBTL1
SCHEMBL14866962 0.86 ALDH1A1 (0.41) ALDH1A1NPC1RAB9ATSHRL3MBTL1
SCHEMBL14866808 0.85 ALDH1A1 (0.38) ALDH1A1NPC1RAB9ATSHRL3MBTL1
SCHEMBL682266 0.85 ALDH1A1 (0.43) ALDH1A1NPC1RAB9ATSHRL3MBTL1
SCHEMBL14924833 0.83 KDM1A (0.40) ALDH1A1NPC1RAB9ATSHRL3MBTL1
SCHEMBL16591141 0.79 NPC1 (0.45) ALDH1A1NPC1RAB9ATSHRL3MBTL1
SCHEMBL14461692 0.79 MAOB (0.56) ALDH1A1NPC1RAB9ATSHRL3MBTL1
SCHEMBL14866841 0.79 NPC1 (0.38) ALDH1A1NPC1RAB9ATSHRL3MBTL1
SCHEMBL6722051 0.75 BCHE (0.56) ALDH1A1NPC1RAB9ATSHRL3MBTL1
SCHEMBL10178444 0.74 NPC1 (0.46) ALDH1A1NPC1RAB9ATSHRL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9034558-B2 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern FUJIFILM CORPORATION (JP) 2015-05-19 — — US disclosed
US-20130115557-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN FUJIFILM CORPORATION (JP) 2013-05-09 — — US disclosed
US-20130095429-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME FUJIFILM CORPORATION (JP) 2013-04-18 — — US disclosed
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