SCHEMBL16591141

SCHEMBL16591141

CCC(C)c1ccc(COc2ccc(Oc3c(F)c(F)c(C)c(F)c3F)cc2)cc1

nearest known ligand 0.45

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
▸ NPC1 O15118 2/20 0.45
▸ RAB9A P51151 2/20 0.45
▸ ALDH1A1 P00352 2/20 0.45
▸ TSHR P16473 1/20 0.45
▸ HSP90AA1 P07900 1/20 0.44
▸ L3MBTL1 Q9Y468 1/20 0.44
▸ BCHE P06276 1/20 0.40
▸ RXRA P19793 1/20 0.39
▸ RXRB P28702 1/20 0.39
▸ MEN1 O00255 1/20 0.39
▸ KMT2A Q03164 1/20 0.39
▸ TDP1 Q9NUW8 1/20 0.39
▸ FFAR1 O14842 3/20 0.38
▸ NPBWR1 P48145 1/20 0.38
▸ MCHR1 Q99705 1/20 0.38
▸ APP P05067 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18802898 0.89 ALDH1A1 (0.46) NPC1RAB9AALDH1A1TSHRHSP90AA1
SCHEMBL16591118 0.83 NPC1 (0.46) NPC1RAB9AALDH1A1TSHRHSP90AA1
SCHEMBL14461692 0.81 MAOB (0.56) NPC1RAB9AALDH1A1TSHRHSP90AA1
SCHEMBL14461696 0.79 NPC1 (0.55) NPC1RAB9AALDH1A1TSHRHSP90AA1
SCHEMBL14866953 0.79 ALDH1A1 (0.45) NPC1RAB9AALDH1A1TSHRHSP90AA1
SCHEMBL14866954 0.79 NPC1 (0.55) NPC1RAB9AALDH1A1TSHRHSP90AA1
SCHEMBL10178658 0.78 BCHE (0.55) NPC1RAB9AALDH1A1TSHRHSP90AA1
SCHEMBL16591143 0.77 MEN1 (0.50) NPC1RAB9AALDH1A1TSHRHSP90AA1
SCHEMBL15613870 0.76 FFAR1 (0.59) NPC1RAB9AALDH1A1TSHRHSP90AA1
SCHEMBL27389499 0.75 NPC1 (0.57) NPC1RAB9AALDH1A1TSHRHSP90AA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150086912-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD USING THE SAME, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2015-03-26 — — US disclosed
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