Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX2 | P34913 | 2/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.32 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13932749 | 0.87 | EPHX2 (0.34) | EPHX2L3MBTL1 | |
| SCHEMBL13144964 | 0.85 | EPHX2 (0.37) | EPHX2L3MBTL1EPHX1HSD11B1 | |
| SCHEMBL18802866 | 0.84 | EPHX2 (0.33) | EPHX2L3MBTL1EPHX1HSD11B1 | |
| SCHEMBL15910721 | 0.83 | EPHX2 (0.34) | EPHX2L3MBTL1EPHX1HSD11B1 | |
| SCHEMBL15908871 | 0.79 | EPHX2 (0.32) | EPHX2L3MBTL1EPHX1HSD11B1 | |
| SCHEMBL6367094 | 0.78 | EPHX2 (0.36) | EPHX2L3MBTL1HSD11B1 | |
| SCHEMBL14984183 | 0.78 | ALDH1A1 (0.32) | EPHX2L3MBTL1EPHX1HSD11B1 | |
| SCHEMBL17735912 | 0.75 | HSD11B1 (0.36) | EPHX2L3MBTL1EPHX1HSD11B1 | |
| SCHEMBL17752193 | 0.75 | HSD11B1 (0.36) | EPHX2L3MBTL1EPHX1HSD11B1 | |
| SCHEMBL6722085 | 0.75 | HSD11B1 (0.41) | EPHX2L3MBTL1EPHX1HSD11B1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8883396-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-11-11 | — | — | US | disclosed |
| US-20130137048-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-05-30 | — | — | US | disclosed |
| US-20130095427-A1 | RESIST COMPOSITION FOR EUV OR EB AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-04-18 | — | — | US | disclosed |