SCHEMBL1487652

SCHEMBL1487652

N#Cc1cccc(S(=O)(=O)O)c1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.52
ALDH1A1 P00352 1/20 0.52
HSD17B10 Q99714 1/20 0.52
TDP1 Q9NUW8 1/20 0.52
ENPP2 Q13822 1/20 0.50
KAT6A Q92794 2/20 0.48
MCOLN3 Q8TDD5 1/20 0.48
PGR P06401 1/20 0.47
SMN1; SMN2 Q16637 1/20 0.46
NR1H3 Q13133 1/20 0.45
CTSG P08311 1/20 0.44
CMA1 P23946 1/20 0.44
GLO1 Q04760 1/20 0.44
SLC40A1 Q9NP59 1/20 0.44
PPME1 Q9Y570 1/20 0.44
FEN1 P39748 1/20 0.44
ACLY P53396 1/20 0.43
GSK3B P49841 2/20 0.43
CA12 O43570 1/20 0.43
CA1 P00915 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL28265694 0.98 TSHR (0.50) TSHRALDH1A1HSD17B10TDP1ENPP2
SCHEMBL27602948 0.89 TSHR (0.59) TSHRALDH1A1HSD17B10TDP1ENPP2
Pyridine SCHEMBL15271600 0.88 NAPRT (0.46) TSHRALDH1A1HSD17B10TDP1ENPP2
SCHEMBL5717991 0.82 TSHR (0.53) TSHRALDH1A1HSD17B10TDP1SMN1; SMN2
Benzonitrile SCHEMBL28743961 0.82 TSHR (0.67) TSHRALDH1A1KAT6APGRSMN1; SMN2
SCHEMBL1891657 0.82 MCOLN3 (0.49) ENPP2KAT6AMCOLN3PGRNR1H3
SCHEMBL27602928 0.80 BCHE (0.47) TSHRALDH1A1TDP1SMN1; SMN2CA12
Water SCHEMBL10990733 0.80 ALDH1A1 (0.67) TSHRALDH1A1HSD17B10TDP1SMN1; SMN2
Benzonitrile SCHEMBL28800006 0.80 KAT6A (0.46) TSHRALDH1A1HSD17B10TDP1ENPP2
SCHEMBL791765 0.80 CA2 (0.67) MCOLN3PGRCA12CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230022289-A1 ORGANIC COMPOUND, P-TYPE DOPED MATERIAL AND APPLICATION THEREOF SHANGHAI TIANMA MICROELECTRONICS CO., LTD. (CN) 2023-01-26 US disclosed
CN-105849638-B Active light-sensitive or radiation-sensitive resin composition and film 富士胶片株式会社 2020-07-07 CN disclosed
CN-105900013-B Active light-sensitive or radiation-sensitive resin composition and film 富士胶片株式会社 2019-12-24 CN disclosed
US-10394127-B2 Pattern forming method and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2019-08-27 US disclosed
EP-3106920-B1 ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PHOTOMASK, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORP (JP) 2019-07-10 EP disclosed
US-10120281-B2 Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, photomask, pattern forming method, method for manufacturing electronic device, and electronic device FUJIFILM CORPORATION (JP) 2018-11-06 US disclosed
US-9958775-B2 Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blanks including actinic ray-sensitive or radiation-sensitive film, pattern forming method and photomask FUJIFILM CORPORATION (JP) 2018-05-01 US disclosed
US-20180017872-A1 PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2018-01-18 US disclosed
US-9718901-B2 Resin composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2017-08-01 US disclosed
US-9557643-B2 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same and electronic device FUJIFILM CORPORATION (JP) 2017-01-31 US disclosed
US-20110102528-A1 COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND INKJET RECORDING METHOD FUJIFILM CORPORATION (JP) 2011-05-05 US disclosed
WO-2011035209-A1 SUBSTITUTED BENZAMIDE ANALOGS AS MGLUR5 NEGATIVE ALLOSTERIC MODULATORS AND METHODS OF MAKING AND USING THE SAME VANDERBILT UNIVERSTIY (US) 2011-03-24 WO disclosed
US-7625932-B2 Pyrrole and pyrazole derivatives as potentiators of glutamate receptors ELI LILLY AND COMPANY (US) 2009-12-01 US disclosed
US-7541410-B2 Thermosetting resin composition, thermosetting resin molding compound and cured product thereof SUMITOMO BAKELITE CO., LTD. (JP) 2009-06-02 US disclosed
EP-1670757-B1 PYRROLE AND PYRAZOLE DERIVATIVES AS POTENTIATORS OF GLUTAMATE RECEPTORS LILLY CO ELI (US) 2009-05-06 EP disclosed
US-20080139757-A1 Thermosetting Resin Composition, Thermosetting Resin Molding Compound And Cured Product Thereof SUMITOMO BAKELITE CO., LTD. (JP) 2008-06-12 US disclosed
CN-101065445-A Thermosetting resin composition, thermosetting-resin molding material, and cured object obtained therefrom SUMITOMO BAKELITE CO (JP) 2007-10-31 CN disclosed
US-20070066573-A1 Pyrrole and pyrazole derivatives as potentiators of glutamate receptors ELI LILLY AND COMPANY 2007-03-22 US disclosed
EP-1670757-A1 PYRROLE AND PYRAZOLE DERIVATIVES AS POTENTIATORS OF GLUTAMATE RECEPTORS ELI LILLY AND COMPANY (US) 2006-06-21 EP disclosed
WO-2005040110-A1 PYRROLE AND PYRAZOLE DERIVATIVES AS POTENTIATORS OF GLUTAMATE RECEPTORS ELI LILLY AND COMPANY (US) 2005-05-06 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110102528-A1 COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND INKJET RECORDING METHOD ARFGAP1, FRG1, RHOA TSHR 4606/4885ALDH1A1 659/4885HSD17B10 2032/4885
US-20230022289-A1 ORGANIC COMPOUND, P-TYPE DOPED MATERIAL AND APPLICATION THEREOF OCIAD1, OCIAD2, POF1B TSHR 4459/4885ALDH1A1 2073/4885HSD17B10 1766/4885
US-20070066573-A1 Pyrrole and pyrazole derivatives as potentiators of glutamate receptors GRIN1, GRIN3A, GRIK5 TSHR 315/4885ALDH1A1 2211/4885HSD17B10 3375/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.