Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2A6 | P11509 | 8/20 | 0.52 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.50 |
| ▸ | RAB9A | P51151 | 2/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.50 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.50 |
| ▸ | TSHR | P16473 | 1/20 | 0.44 |
| ▸ | TYR | P14679 | 1/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.43 |
| ▸ | ALDH5A1 | P51649 | 1/20 | 0.43 |
| ▸ | ABAT | P80404 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
| ▸ | RELA | Q04206 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29433921 | 1.00 | CYP2A6 (0.52) | CYP2A6ALDH1A1RAB9AKDM4EPTGS2 | |
| SCHEMBL9883838 | 0.92 | CYP2A6 (0.50) | CYP2A6ALDH1A1RAB9AKDM4EPTGS2 | |
| SCHEMBL30972495 | 0.92 | CYP2A6 (0.50) | CYP2A6ALDH1A1RAB9AKDM4EPTGS2 | |
| SCHEMBL29617404 | 0.92 | CYP2A6 (0.50) | CYP2A6ALDH1A1RAB9AKDM4EPTGS2 | |
| SCHEMBL19182196 | 0.92 | CYP2A6 (0.50) | CYP2A6ALDH1A1RAB9AKDM4EPTGS2 | |
| SCHEMBL29617405 | 0.92 | CYP2A6 (0.50) | CYP2A6ALDH1A1RAB9AKDM4EPTGS2 | |
| SCHEMBL977774 | 0.91 | CYP2A6 (0.54) | CYP2A6ALDH1A1RAB9AKDM4EPTGS2 | |
| 2-Naphthaldehyde SCHEMBL51340 | 0.87 | RELA (0.58) | CYP2A6ALDH1A1RAB9AKDM4ERELA | |
| 2-Naphthaldehyde SCHEMBL30229844 | 0.87 | RELA (0.58) | CYP2A6ALDH1A1RAB9AKDM4ERELA | |
| 2-Naphthaldehyde SCHEMBL28110154 | 0.87 | RELA (0.58) | CYP2A6ALDH1A1RAB9AKDM4ERELA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 83 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115873226-B | Copolycarbonate and preparation method and application thereof | 万华化学集团股份有限公司 | 2024-05-03 | — | — | CN | disclosed |
| US-20230330604-A1 | MOLECULARLY POROUS CROSS-LINKED MEMBRANES | UNIV KING ABDULLAH SCI & TECH (SA) | 2023-10-19 | — | — | US | disclosed |
| CN-115873226-A | Copolycarbonate, preparation method and application thereof | 万华化学集团股份有限公司 | 2023-03-31 | — | — | CN | disclosed |
| WO-2022058961-A1 | MOLECULARLY POROUS CROSS-LINKED MEMBRANES | KING ABDULLAH UNIVERSITY OF SCIENCE AND TECHNOLOGY (SA) | 2022-03-24 | — | — | WO | disclosed |
| WO-2021160132-A1 | HETEROCYCLIC COMPOUND, PREPARATION METHOD THEREFOR, AND USE THEREOF | 上海美悦生物科技发展有限公司 | 2021-08-19 | — | — | WO | disclosed |
| EP-3062151-B1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM | MITSUBISHI GAS CHEMICAL CO (JP) | 2021-05-05 | — | — | EP | disclosed |
| EP-3141957-B1 | RESIST MATERIAL, RESIST COMPOSITION, AND RESIST PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL CO (JP) | 2021-03-24 | — | — | EP | disclosed |
| EP-2955575-B1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND POLYPHENOL DERIVATIVE USED IN SAME | MITSUBISHI GAS CHEMICAL CO (JP) | 2020-07-29 | — | — | EP | disclosed |
| CN-106462059-B | Resist material, resist composition, and resist pattern forming method | 三菱瓦斯化学株式会社 | 2020-07-28 | — | — | CN | disclosed |
| CN-106957217-B | Polyhydric phenol compound for resist composition | 三菱瓦斯化学株式会社 | 2020-07-24 | — | — | CN | disclosed |
| CN-101088046-A | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL CO (JP) | 2007-12-12 | — | — | CN | disclosed |
| EP-1615286-B1 | Ion conductive polymer electrolyte membrane and production method for the same | POLYMATECH CO LTD (JP) | 2007-09-12 | — | — | EP | disclosed |
| EP-1830228-A1 | COMPOUND FOR RESIST AND RADIATION-SENSITIVE COMPOSITION | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2007-09-05 | — | — | EP | disclosed |
| EP-1615286-A1 | Ion conductive polymer electrolyte membrane and production method for the same | Polymatech Co., Ltd. (JP) | 2006-01-11 | — | — | EP | disclosed |
| US-20060004112-A1 | Molecular chains of the liquid crystalline polymer (e.g. polybenzoxazole, polybenzothiazole, and polybenzimidazole) having an ionic disosciative group and molecular chain orientated in a specific direction; allows permeation of hydrogen ions generated at a fuel electrode (anode) to cathode | POLYMATECH CO., LTD. | 2006-01-05 | — | — | US | disclosed |
| US-20020111514-A1 | Polyaldehyde reaction products | COGNIX CORPORATION (COGNIS CORP.) | 2002-08-15 | — | — | US | disclosed |
| WO-2002050146-A1 | POLYALDEHYDE REACTION PRODUCTS | COGNIS CORPORATION (US) | 2002-06-27 | — | — | WO | disclosed |
| EP-0374269-A1 | Amine thiocyanates as accelerators for cure of polyepoxide-polyimine materials | Ashland Oil, Inc. (US) | 1990-06-27 | — | — | EP | disclosed |
| US-4775735-A | SHELF STABILITY, QUICK-SETTING | ASHLAND OIL, INC. (US) | 1988-10-04 | — | — | US | disclosed |
| US-3990180-A | Peat containers for the planting of containerized seedlings | BUNTING WILLIAM M | 1976-11-09 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20020111514-A1 | Polyaldehyde reaction products | OXER1, RER1, ME1 | CYP2A6 927/4885ALDH1A1 1019/4885RAB9A 4281/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.