SCHEMBL14904374

SCHEMBL14904374

C=C(C)C(=C)Nc1ccc2cc(O)ccc2c1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 4/20 0.41
ALDH1A1 P00352 4/20 0.39
MEN1 O00255 3/20 0.39
KMT2A Q03164 3/20 0.39
HIF1A Q16665 2/20 0.39
CYP2C19 P33261 2/20 0.39
KDM4E B2RXH2 2/20 0.39
ESR1 P03372 4/20 0.38
ESR2 Q92731 4/20 0.38
CYP3A4 P08684 3/20 0.38
TSHR P16473 2/20 0.38
ALOX15 P16050 1/20 0.38
HSD17B10 Q99714 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
F12 P00748 1/20 0.38
SRC P12931 1/20 0.38
TRPV1 Q8NER1 1/20 0.38
ESRRG P62508 1/20 0.38
MAPT P10636 3/20 0.37
CA12 O43570 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14789934 0.85 CYP1A2 (0.43) CYP1A2ALDH1A1MEN1KMT2AHIF1A
SCHEMBL10040412 0.83 TDP1 (0.53) CYP1A2ALDH1A1MEN1KMT2AHIF1A
SCHEMBL26811624 0.81 MAPT (0.56) ALDH1A1MEN1KMT2AHIF1AKDM4E
SCHEMBL10064083 0.78 TDP1 (0.51) CYP1A2ALDH1A1MEN1KMT2AHIF1A
SCHEMBL1808467 0.78 MEN1 (0.64) CYP1A2ALDH1A1MEN1KMT2AHIF1A
SCHEMBL4670484 0.72 APP (0.50) CYP1A2ALDH1A1HIF1ACYP2C19ESR1
SCHEMBL8203018 0.72 NPC1 (0.50) CYP1A2ALDH1A1MEN1KMT2AESR1
SCHEMBL17049917 0.70 SRC (0.50) CYP1A2ALDH1A1MEN1KMT2AHIF1A
SCHEMBL19335548 0.70 L3MBTL1 (0.60) ALDH1A1MEN1KMT2AKDM4ETRPV1
SCHEMBL26885117 0.70 ALDH1A1 (0.57) ALDH1A1MEN1KMT2AKDM4EMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130108960-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-05-02 US disclosed
US-20130108960-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-05-02 US disclosed