SCHEMBL14914213

SCHEMBL14914213

C=C[SiH2]c1c(C)cc(C)cc1C

nearest known ligand 0.36

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
RAPGEF4 Q8WZA2 2/20 0.36
KMT2A Q03164 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
KDM4E B2RXH2 1/20 0.31
ALDH1A1 P00352 1/20 0.31
LMNA P02545 1/20 0.31
GAA P10253 1/20 0.31
MAPT P10636 1/20 0.31
CYP1A2 P05177 1/20 0.30
CYP2A6 P11509 1/20 0.30
TP53 P04637 1/20 0.30
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28151457 0.74 ALDH1A1 (0.35) ALDH1A1TP53TDP1
SCHEMBL12609408 0.71 RAPGEF4 (0.43) RAPGEF4KMT2ASMN1; SMN2KDM4EALDH1A1
SCHEMBL8384844 0.71 RAPGEF4 (0.43) RAPGEF4KDM4EALDH1A1LMNAGAA
Hydrochloric Acid SCHEMBL1033243 0.69 RAPGEF4 (0.41) RAPGEF4KMT2ASMN1; SMN2KDM4EALDH1A1
SCHEMBL8156125 0.69 RAPGEF4 (0.41) RAPGEF4KDM4EALDH1A1LMNAGAA
SCHEMBL8741677 0.67 RAPGEF4 (0.39) RAPGEF4KDM4EALDH1A1LMNAGAA
SCHEMBL8381909 0.67 RAPGEF4 (0.39) RAPGEF4KDM4EALDH1A1LMNAGAA
SCHEMBL3481737 0.67 RAPGEF4 (0.39) RAPGEF4KDM4EALDH1A1LMNAGAA
SCHEMBL106587 0.67 RAPGEF4 (0.39) RAPGEF4KMT2ASMN1; SMN2KDM4EALDH1A1
Butadiene SCHEMBL11268131 0.67 RAPGEF4 (0.46) RAPGEF4KMT2ASMN1; SMN2KDM4EALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3135745-B1 SEMICONDUCTOR NANOPARTICLE ASSEMBLY AND METHOD FOR PRODUCING SAME KONICA MINOLTA INC (JP) 2021-03-10 EP disclosed
US-10208245-B2 Semiconductor nanoparticle assembly and method for manufacturing the same Konica Minolta, Inc. (JP) 2019-02-19 US disclosed
US-20170210981-A1 SEMICONDUCTOR NANOPARTICLE ASSEMBLY AND METHOD FOR MANUFACTURING THE SAME Konica Minolta, Inc. (JP) 2017-07-27 US disclosed
EP-3135745-A1 SEMICONDUCTOR NANOPARTICLE ASSEMBLY AND METHOD FOR PRODUCING SAME Konica Minolta, Inc. (JP) 2017-03-01 EP disclosed
US-9359505-B2 Gas barrier film, process for production of gas barrier film, and electronic device KONICA MINOLTA HOLDINGS, INC. (JP) 2016-06-07 US disclosed
EP-2599621-B1 GAS BARRIER FILM, PROCESS FOR PRODUCTION OF GAS BARRIER FILM, AND ELECTRONIC DEVICE KONICA MINOLTA HOLDINGS INC (JP) 2016-03-02 EP disclosed
EP-2724854-A1 GAS BARRIER FILM, MANUFACTURING PROCESS FOR GAS BARRIER FILM, AND ELECTRONIC DEVICE Konica Minolta, Inc. (JP) 2014-04-30 EP disclosed
EP-2599621-A1 GAS BARRIER FILM, PROCESS FOR PRODUCTION OF GAS BARRIER FILM, AND ELECTRONIC DEVICE Konica Minolta Holdings, Inc. (JP) 2013-06-05 EP disclosed
US-20130115423-A1 GAS BARRIER FILM, PROCESS FOR PRODUCTION OF GAS BARRIER FILM, AND ELECTRONIC DEVICE KONICA MINOLTA HOLDINGS, INC. (JP) 2013-05-09 US disclosed