SCHEMBL2492082

SCHEMBL2492082

CCc1ccccc1C1(C2(c3ccccc3CC)N=C(c3ccc(C(=O)OC)cc3)C(c3ccc(C(=O)OC)cc3)=N2)N=C(c2ccc(C(=O)OC)cc2)C(c2ccc(C(=O)OC)cc2)=N1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.42
PTPN1 P18031 2/20 0.41
RAB9A P51151 4/20 0.40
MAPT P10636 4/20 0.40
ALDH1A1 P00352 4/20 0.40
HPGD P15428 3/20 0.40
SMN1; SMN2 Q16637 3/20 0.40
KDM4E B2RXH2 3/20 0.40
NPC1 O15118 2/20 0.40
LMNA P02545 2/20 0.40
HSD17B10 Q99714 1/20 0.40
PKM P14618 1/20 0.40
NFKB1 P19838 1/20 0.40
NFKB2 Q00653 1/20 0.40
RELA Q04206 1/20 0.40
MAPK1 P28482 1/20 0.40
EGFR P00533 1/20 0.40
CASP3 P42574 1/20 0.39
SENP8 Q96LD8 1/20 0.39
SENP7 Q9BQF6 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8427318 0.88 PDK2 (0.46) TSHRRAB9AMAPTALDH1A1HPGD
SCHEMBL2493563 0.84 TSHR (0.45) TSHRPTPN1RAB9AMAPTALDH1A1
SCHEMBL8663910 0.83 TSHR (0.44) TSHRPTPN1RAB9AMAPTALDH1A1
SCHEMBL8078179 0.83 TSHR (0.44) TSHRPTPN1RAB9AMAPTALDH1A1
SCHEMBL2497787 0.82 EGFR (0.52) TSHRPTPN1RAB9AMAPTALDH1A1
SCHEMBL8665435 0.81 MAPT (0.42) TSHRRAB9AMAPTALDH1A1HPGD
SCHEMBL8668402 0.81 RAB9A (0.48) TSHRPTPN1RAB9AMAPTALDH1A1
SCHEMBL149221 0.80 CYP2D6 (0.41) TSHRRAB9AMAPTALDH1A1HPGD
SCHEMBL8664266 0.80 MAPT (0.41) TSHRPTPN1RAB9AMAPTALDH1A1
SCHEMBL8666374 0.79 MAPT (0.46) TSHRMAPTALDH1A1HPGDSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10113907-B2 Ultraviolet-sensing sheet, ultraviolet-sensing set, and ultraviolet-sensing method FUJIFILM CORPORATION (JP) 2018-10-30 US disclosed
US-20170131144-A1 ULTRAVIOLET-SENSING SHEET, ULTRAVIOLET-SENSING SET, AND ULTRAVIOLET-SENSING METHOD FUJIFILM CORPORATION (JP) 2017-05-11 US disclosed
US-9068082-B2 Colored curable composition and color filter FUJIFILM CORPORATION (JP) 2015-06-30 US disclosed
US-20150108086-A1 COLORED CURABLE COMPOSITION AND COLOR FILTER FUJIFILM CORPORATION (JP) 2015-04-23 US disclosed
US-8029877-B2 Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panel DAI NIPPON PRINTING CO., LTD. (JP) 2011-10-04 US disclosed
US-20100238388-A1 CURABLE RESIN COMPOSITION, CURABLE RESIN COMPOSITION FOR FORMING PHOTOSENSITIVE PATTERN, COLOR FILTER, LIQUID CRYSTAL PANEL SUBSTRATE AND LIQUID CRYSTAL PANEL DAI NIPPON PRINTING CO., LTD. (JP) 2010-09-23 US disclosed
US-7758930-B2 Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panel DAI NIPPON PRINTING CO., LTD. (JP) 2010-07-20 US disclosed
US-20090202749-A1 CURABLE RESIN COMPOSITION, CURABLE RESIN COMPOSITION FOR FORMING PHOTOSENSITIVE PATTERN, COLOR FILTER, LIQUID CRYSTAL PANEL SUBSTRATE AND LIQUID CRYSTAL PANEL HAYASHI SHINJI 2009-08-13 US disclosed
US-7537810-B2 Curable resin composition, photosensitive pattern-forming curable resin composition, color filter, substrate for liquid crystalline panel, and liquid crystalline panel DAI NIPPON PRINTING CO., LTD. (JP) 2009-05-26 US disclosed
US-20060229376-A1 Curable resin composition, photosensitive pattern-forming curable resin composition,color filter, substrate for liquid crystalline panel, and liquid crystalline panel DAI NIPPON PRINTING CO., LTD. (JP) 2006-10-12 US disclosed
US-5866298-A Radiation sensitive composition for color filters JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1999-02-02 US disclosed
US-5792589-A ORGANIC BINDER; OPTICALLY CROSSLINKABLE COMPOUND; RADICAL-GENERATING AGENT: 2,4,5-TRIARYL IMIDAZOLE DIMER, AMINO-GROUP CONTAINING BENZOPHENONE PHOTOSENSITIZER, A THIOL COMPOUND JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-08-11 US disclosed
EP-0775941-A1 Radiation sensitive composition for color filters JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1997-05-28 EP disclosed