SCHEMBL14929446

SCHEMBL14929446

CCC(C)(CC)C(=O)OCC1COC(C)(C)O1

nearest known ligand 0.47

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
CA2 P00918 2/20 0.47
ALDH1A1 P00352 2/20 0.34
NPSR1 Q6W5P4 1/20 0.34
TMEM97 Q5BJF2 2/20 0.34
SIGMAR1 Q99720 2/20 0.34
HTR7 P34969 1/20 0.34
DGAT1 O75907 1/20 0.32
CTDSP1 Q9GZU7 1/20 0.32
APP P05067 1/20 0.30
HCRTR2 O43614 1/20 0.30
F10 P00742 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26996562 0.92 CA2 (0.43) CA2ALDH1A1NPSR1TMEM97SIGMAR1
SCHEMBL11160355 0.90 CA2 (0.41) CA2ALDH1A1NPSR1TMEM97SIGMAR1
SCHEMBL10167848 0.88 CA2 (0.47) CA2ALDH1A1NPSR1TMEM97SIGMAR1
SCHEMBL11922847 0.86 CA2 (0.50) CA2ALDH1A1NPSR1TMEM97SIGMAR1
SCHEMBL23602332 0.84 CA2 (0.48) CA2ALDH1A1NPSR1TMEM97SIGMAR1
SCHEMBL106425 0.84 CA2 (0.48) CA2ALDH1A1NPSR1TMEM97SIGMAR1
SCHEMBL14036948 0.84 CA2 (0.48) CA2ALDH1A1NPSR1TMEM97SIGMAR1
SCHEMBL9610772 0.84 CA2 (0.48) CA2ALDH1A1NPSR1TMEM97SIGMAR1
SCHEMBL14713377 0.82 CA2 (0.42) CA2ALDH1A1NPSR1TMEM97SIGMAR1
SCHEMBL11170335 0.81 CA2 (0.46) CA2ALDH1A1NPSR1TMEM97SIGMAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8790867-B2 Methods of forming photolithographic patterns by negative tone development ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-07-29 US disclosed
US-20130302735-A1 MONOMERS, POLYMERS AND PHOTORESIST COMPOSITIONS ROHM & HAAS ELECT MAT (US) 2013-11-14 US disclosed
US-20130115559-A1 METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS BY NEGATIVE TONE DEVELOPMENT ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2013-05-09 US disclosed