Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 2/20 | 0.47 |
| ▸ | TMEM97 | Q5BJF2 | 2/20 | 0.36 |
| ▸ | SIGMAR1 | Q99720 | 2/20 | 0.36 |
| ▸ | HMGCR | P04035 | 4/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.34 |
| ▸ | HTR7 | P34969 | 1/20 | 0.34 |
| ▸ | DGAT1 | O75907 | 1/20 | 0.32 |
| ▸ | CTDSP1 | Q9GZU7 | 1/20 | 0.32 |
| ▸ | APP | P05067 | 1/20 | 0.30 |
| ▸ | HCRTR2 | O43614 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14929446 | 0.88 | CA2 (0.47) | CA2TMEM97SIGMAR1ALDH1A1NPSR1 | |
| SCHEMBL11922847 | 0.86 | CA2 (0.50) | CA2TMEM97SIGMAR1ALDH1A1NPSR1 | |
| SCHEMBL13642031 | 0.86 | HMGCR (0.36) | CA2HMGCR | |
| SCHEMBL13642459 | 0.86 | CA2 (0.38) | CA2TMEM97SIGMAR1HMGCRALDH1A1 | |
| SCHEMBL13642027 | 0.86 | CTDSP1 (0.38) | CA2HMGCRALDH1A1CTDSP1 | |
| SCHEMBL25468169 | 0.85 | HMGCR (0.33) | CA2HMGCRALDH1A1CTDSP1 | |
| SCHEMBL13641643 | 0.85 | CTDSP1 (0.39) | CA2TMEM97SIGMAR1HMGCRALDH1A1 | |
| SCHEMBL18286659 | 0.85 | CA2 (0.43) | CA2TMEM97SIGMAR1ALDH1A1NPSR1 | |
| SCHEMBL13642024 | 0.84 | HMGCR (0.34) | CA2HMGCRALDH1A1CTDSP1 | |
| SCHEMBL106425 | 0.84 | CA2 (0.48) | CA2TMEM97SIGMAR1ALDH1A1NPSR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 77 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11829069-B2 | Photoresist compositions and methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2023-11-28 | — | — | US | disclosed |
| US-20230350290-A1 | PATTERN FORMING METHOD, KIT, AND RESIST COMPOSITION | FUJIFILM CORPORATION (JP) | 2023-11-02 | — | — | US | disclosed |
| US-20230333478-A1 | PATTERN FORMING METHOD, METHOD FOR PRODUCING ELECTRONIC DEVICE, AND KIT | FUJIFILM CORPORATION (JP) | 2023-10-19 | — | — | US | disclosed |
| US-11747727-B2 | Chemical liquid, chemical liquid storage body, pattern forming method, and kit | FUJIFILM CORPORATION (JP) | 2023-09-05 | — | — | US | disclosed |
| US-11733611-B2 | Pattern forming method, method for producing electronic device, and kit | FUJIFILM CORPORATION (JP) | 2023-08-22 | — | — | US | disclosed |
| US-20230135117-A1 | SOLUTION, SOLUTION STORAGE BODY, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2023-05-04 | — | — | US | disclosed |
| US-11640114-B2 | Compound, resin, photoresist composition and process for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-05-02 | — | — | US | disclosed |
| US-20180059545-A1 | MONOMERS, POLYMERS AND PHOTORESIST COMPOSITIONS | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2018-03-01 | — | — | US | disclosed |
| US-9766547-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method of manufacturing electronic device using the same, and electronic device | FUJIFILM CORPORATION (JP) | 2017-09-19 | — | — | US | disclosed |
| US-20170097565-A1 | ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-04-06 | — | — | US | disclosed |
| US-20120308927-A1 | POLYMERS, PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAHIC PATTERNS | DOW GLOBAL TECHNOLOGIES LLC (US) | 2012-12-06 | — | — | US | disclosed |
| US-20120282548-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2012-11-08 | — | — | US | disclosed |
| US-8299142-B2 | Ink composition, inkjet recording method, and printed article | FUJIFILM CORPORATION (JP) | 2012-10-30 | — | — | US | disclosed |
| US-20120219913-A1 | PATTERN FORMING METHOD, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2012-08-30 | — | — | US | disclosed |
| US-20120171617-A1 | POLYMERS, PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS | DOW GLOBAL TECHNOLOGIES LLC (US) | 2012-07-05 | — | — | US | disclosed |
| US-20120052449-A1 | METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2012-03-01 | — | — | US | disclosed |
| US-20120028196-A1 | METHOD OF FORMING PATTERN AND ORGANIC PROCESSING LIQUID FOR USE IN THE METHOD | FUJIFILM CORPORATION (JP) | 2012-02-02 | — | — | US | disclosed |
| US-20090197055-A1 | Ink composition, inkjet recording method, and printed article | FUJIFILM CORPORATION (JP) | 2009-08-06 | — | — | US | disclosed |
| US-20090027608-A1 | PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE RESIN TRANSFER FILM, AND METHOD FOR PRODUCING A PHOTOSPACER, AND SUBSTRATE FOR A LIQUID CRYSTAL DISPLAY DEVICE AND LIQUID DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2009-01-29 | — | — | US | disclosed |
| US-7419761-B2 | Photoresist monomer having spiro cyclic ketal group, polymer thereof and photoresist composition including the same | DONGJIN SEMICHEM CO., LTD. (KR) | 2008-09-02 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11640114-B2 | Compound, resin, photoresist composition and process for producing photoresist pattern | HAX1, BRIX1, RXRA | CA2 4741/4885TMEM97 4362/4885SIGMAR1 1677/4885 |
| US-20180059545-A1 | MONOMERS, POLYMERS AND PHOTORESIST COMPOSITIONS | PARG, LCP1, ALG3 | CA2 4082/4885TMEM97 4863/4885SIGMAR1 3676/4885 |
| US-20120282548-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM | RAD51, RER1, RXRA | CA2 3775/4885TMEM97 3731/4885SIGMAR1 3377/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.