SCHEMBL9610772

SCHEMBL9610772

CC1(C)OCC(COC(=O)C(C)(F)F)O1

nearest known ligand 0.48

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
CA2 P00918 2/20 0.48
ALDH1A1 P00352 2/20 0.37
NPSR1 Q6W5P4 1/20 0.37
HTR7 P34969 1/20 0.36
DGAT1 O75907 1/20 0.36
TMEM97 Q5BJF2 2/20 0.34
SIGMAR1 Q99720 2/20 0.34
MMP2 P08253 2/20 0.32
MMP9 P14780 2/20 0.32
HCRTR2 O43614 1/20 0.31
APP P05067 1/20 0.31
F10 P00742 1/20 0.31
MAPK14 Q16539 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9610778 0.90 CA2 (0.43) CA2ALDH1A1NPSR1HTR7DGAT1
SCHEMBL11922847 0.88 CA2 (0.50) CA2ALDH1A1NPSR1HTR7DGAT1
SCHEMBL30364186 0.87 CA2 (0.47) CA2ALDH1A1NPSR1HTR7DGAT1
SCHEMBL23602332 0.85 CA2 (0.48) CA2ALDH1A1NPSR1HTR7DGAT1
SCHEMBL106425 0.85 CA2 (0.48) CA2ALDH1A1NPSR1HTR7DGAT1
SCHEMBL14036948 0.85 CA2 (0.48) CA2ALDH1A1NPSR1HTR7DGAT1
SCHEMBL9610785 0.84 PABPC1 (0.40) CA2ALDH1A1TMEM97SIGMAR1
SCHEMBL14929446 0.84 CA2 (0.47) CA2ALDH1A1NPSR1HTR7DGAT1
SCHEMBL10167848 0.84 CA2 (0.47) CA2ALDH1A1NPSR1HTR7DGAT1
SCHEMBL9610786 0.83 PABPC1 (0.42) CA2ALDH1A1TMEM97SIGMAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9527809-B2 Compound, actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern formation method, and method for manufacturing electronic device using same, and electronic device FUJIFILM CORPORATION (JP) 2016-12-27 US disclosed
US-20160024005-A1 COMPOUND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING SAME, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2016-01-28 US disclosed
US-20130122427-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM FUJIFILM CORPORATION (JP) 2013-05-16 US disclosed
US-8420294-B2 Salt and photoresist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-04-16 US disclosed
US-20120135351-A1 SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2012-05-31 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120135351-A1 SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME C1R, AFF1, C1S CA2 122/4885ALDH1A1 3397/4885NPSR1 360/4885
US-20160024005-A1 COMPOUND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING SAME, AND ELECTRONIC DEVICE RER1, RAD51, TERB1 CA2 4842/4885ALDH1A1 2091/4885NPSR1 3176/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.