SCHEMBL149505

SCHEMBL149505

CC(=O)Nc1ccc(S(=O)(=O)O)cc1Cl

nearest known ligand 0.74

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
CA1 P00915 9/20 0.74
CA2 P00918 9/20 0.74
CA9 Q16790 6/20 0.74
CASP6 P55212 1/20 0.56
KMT2A Q03164 3/20 0.53
ALDH1A1 P00352 2/20 0.53
MEN1 O00255 1/20 0.52
NPC1 O15118 1/20 0.50
PDK1 Q15118 3/20 0.48
PDK2 Q15119 3/20 0.48
PDK3 Q15120 3/20 0.48
PDK4 Q16654 3/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL27729129 0.98 CA1 (0.72) CA1CA2CA9CASP6KMT2A
SCHEMBL1020216 0.87 CA1 (0.74) CA1CA2CA9KMT2AALDH1A1
SCHEMBL15095560 0.87 CA1 (0.74) CA1CA2CA9KMT2AALDH1A1
SCHEMBL3223297 0.85 CA1 (1.00) CA1CA2CA9
SCHEMBL11759864 0.84 CA1 (0.59) CA1CA2CA9
SCHEMBL29590447 0.83 CA1 (0.68) CA1CA2CA9KMT2AALDH1A1
SCHEMBL12555528 0.81 CASP6 (0.57) CA1CA2CA9CASP6KMT2A
SCHEMBL11716215 0.81 CA2 (0.49) CA1CA2CA9CASP6KMT2A
SCHEMBL13978696 0.80 CA1 (0.74) CA1CA2CA9CASP6NPC1
SCHEMBL5891041 0.80 CASP6 (0.56) CA1CA2CA9CASP6KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 61 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12415930-B2 Conductive polymer composition, substrate, and method for producing substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-09-16 US disclosed
US-12415931-B2 Conductive polymer composition, substrate, and method for producing substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-09-16 US disclosed
US-12398288-B2 Conductive polymer composition, substrate, and method for producing substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-08-26 US disclosed
EP-4067437-B1 CONDUCTIVE POLYMER COMPOSITION, SUBSTRATE, AND METHOD FOR PRODUCING SUBSTRATE SHINETSU CHEMICAL CO (JP) 2024-08-21 EP disclosed
US-20230159766-A1 CONDUCTIVE POLYMER COMPOSITION, SUBSTRATE, AND METHOD FOR PRODUCING SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
EP-4134388-A1 CONDUCTIVE POLYMER COMPOSITION, SUBSTRATE, AND METHOD FOR PRODUCING SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-02-15 EP disclosed
CN-115397916-A Conductive polymer composition, substrate, and method for producing substrate 信越化学工业株式会社 2022-11-25 CN disclosed
US-20220332957-A1 CONDUCTIVE POLYMER COMPOSITION, SUBSTRATE, AND METHOD FOR PRODUCING SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-10-20 US disclosed
EP-4067437-A2 CONDUCTIVE POLYMER COMPOSITION, SUBSTRATE, AND METHOD FOR PRODUCING SUBSTRATE Shin-Etsu Chemical Co., Ltd. (JP) 2022-10-05 EP disclosed
US-11417842-B2 Conductive polymer composite and conductive polymer composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-08-16 US disclosed
US-20090244027-A1 TRANSPARENT CONDUCTIVE SHEET FOR TOUCH PANEL, METHOD FOR MANUFACTURING SAME AND TOUCH PANEL SHIN-ETSU POLYMER CO., LTD. (JP) 2009-10-01 US disclosed
EP-1947655-A1 TRANSPARENT CONDUCTIVE SHEET FOR TOUCH PANEL, METHOD FOR MANUFACTURING SAME AND TOUCH PANEL SHIN-ETSU POLYMER CO., LTD. (JP) 2008-07-23 EP disclosed
CN-101137718-A Conductive polymer solution, antistatic coating material, antistatic hard coat layer, optical filter, conductive coating film, antistatic adhesive layer, protective material, and method for producing same SHINETSU POLYMER CO (JP) 2008-03-05 CN disclosed
CN-101113238-A Conductive composition, and process for producing the same SHINETSU POLYMER CO (JP) 2008-01-30 CN disclosed
CN-101113222-A Conductive composition, photo-electric converting element, and process for producing the same SHINETSU POLYMER CO (JP) 2008-01-30 CN disclosed
CN-101040002-A Conductive composition and conductive crosslinked material, capacitor and method for manufacturing same, antistatic coating composition, antistatic coat, antistatic film, optical filter and optical in SHINETSU POLYMER CO (JP) 2007-09-19 CN disclosed
CN-101035860-A Conductive composition and method for producing same, antistatic coating, antistatic film, optical filter, optical information recording medium, and capacitor and method for producing same SHINETSU POLYMER CO (JP) 2007-09-12 CN disclosed
CN-101023138-A Conductive composition and process for production thereof, antistatic coating material, antistatic membrane, antistatic film, optical filter, optical information recording media, and condenser and pro SHINETSU POLYMER CO (JP) 2007-08-22 CN disclosed
CN-1806005-A Conductive composition, conductive coating material, conductive resin, capacitor, photoelectric conversion element, and method for producing same SHINETSU POLYMER CO (JP) 2006-07-19 CN disclosed
US-20060047030-A1 Conductive composition and conductive cross-linked product, capacitor and production method thereof, and antistatic coating material, antistatic coating, antistatic film, optical filter, and optical information recording medium SHIN-ETSU POLYMER CO., LTD 2006-03-02 US disclosed