SCHEMBL14950787

SCHEMBL14950787

O=C(c1ccccc1)C(SC1CCCCC1)C1CCCC1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 3/20 0.43
ALDH1A1 P00352 2/20 0.43
GAA P10253 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
EPHX1 P07099 3/20 0.41
NPC1 O15118 2/20 0.40
LMNA P02545 2/20 0.39
CYP1A2 P05177 1/20 0.39
CYP2D6 P10635 1/20 0.39
SCN1A P35498 1/20 0.39
SCN2A Q99250 1/20 0.39
SCN3A Q9NY46 1/20 0.39
KMT2A Q03164 4/20 0.38
MEN1 O00255 3/20 0.38
RECQL P46063 1/20 0.37
NPSR1 Q6W5P4 1/20 0.37
MCL1 Q07820 1/20 0.37
MAPT P10636 1/20 0.37
HTR1E P28566 1/20 0.37
S1PR3 Q99500 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15935725 0.78 LMNA (0.42) RAB9AALDH1A1SMN1; SMN2EPHX1LMNA
SCHEMBL29770503 0.76 NPC1 (0.46) RAB9AALDH1A1EPHX1NPC1LMNA
SCHEMBL522599 0.75 LMNA (0.46) RAB9AALDH1A1SMN1; SMN2NPC1LMNA
SCHEMBL15935728 0.75 EPHX1 (0.42) RAB9AALDH1A1GAASMN1; SMN2EPHX1
SCHEMBL9788809 0.73 LMNA (0.49) RAB9AALDH1A1EPHX1NPC1LMNA
SCHEMBL2477876 0.73 LMNA (0.49) RAB9AALDH1A1EPHX1NPC1LMNA
SCHEMBL8393240 0.73 NPC1 (0.44) RAB9AALDH1A1NPC1LMNACYP1A2
SCHEMBL8395224 0.73 NPC1 (0.44) RAB9AALDH1A1NPC1LMNACYP1A2
SCHEMBL14784613 0.73 RAB9A (0.44) RAB9AALDH1A1SMN1; SMN2EPHX1NPC1
SCHEMBL14784435 0.72 RAB9A (0.43) RAB9AALDH1A1SMN1; SMN2EPHX1NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2013069813-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2013-05-16 WO disclosed