SCHEMBL15935728

SCHEMBL15935728

CCCCSC(C(=O)c1ccccc1)C1CCCCC1

nearest known ligand 0.42

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
EPHX1 P07099 6/20 0.42
SLC6A2 P23975 1/20 0.40
SLC6A3 Q01959 1/20 0.40
CHRM3 P20309 1/20 0.40
LMNA P02545 1/20 0.40
CYP1A2 P05177 1/20 0.40
CYP2D6 P10635 1/20 0.40
SCN1A P35498 1/20 0.40
SCN2A Q99250 1/20 0.40
SCN3A Q9NY46 1/20 0.40
SMN1; SMN2 Q16637 2/20 0.39
ALDH1A1 P00352 1/20 0.39
GAA P10253 1/20 0.39
RAB9A P51151 1/20 0.39
TSHR P16473 1/20 0.38
HPGD P15428 1/20 0.38
KCNH2 Q12809 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17127361 0.76 NPY5R (0.41) EPHX1SLC6A2SLC6A3LMNACYP1A2
SCHEMBL15935725 0.75 LMNA (0.42) EPHX1LMNACYP1A2CYP2D6SCN1A
SCHEMBL14950787 0.75 RAB9A (0.43) EPHX1LMNACYP1A2CYP2D6SCN1A
SCHEMBL17127358 0.74 NPY5R (0.39) EPHX1LMNAALDH1A1GAARAB9A
SCHEMBL14534946 0.74 PGR (0.47) EPHX1SLC6A2SLC6A3ALDH1A1KCNH2
SCHEMBL14068917 0.72 SLC6A2 (0.52) SLC6A2SLC6A3CHRM3LMNACYP1A2
SCHEMBL11536485 0.72 SOAT2 (0.46) LMNACYP1A2CYP2D6ALDH1A1GAA
SCHEMBL15172842 0.71 PRSS1 (0.45) SLC6A2SLC6A3ALDH1A1KCNH2
SCHEMBL9788809 0.70 LMNA (0.49) EPHX1CHRM3LMNACYP1A2CYP2D6
SCHEMBL2477876 0.70 LMNA (0.49) EPHX1CHRM3LMNACYP1A2CYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2014133187-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, ELECTRONIC DEVICE AND COMPOUND FUJIFILM CORPORATION (JP) 2014-09-04 WO disclosed
WO-2014119698-A1 PATTERN FORMING METHOD, COMPOUND USED THEREIN, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2014-08-07 WO disclosed