Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ADRA2A | P08913 | 1/20 | 0.43 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.43 |
| ▸ | MAPT | P10636 | 1/20 | 0.41 |
| ▸ | BLM | P54132 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 9/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.39 |
| ▸ | TP53 | P04637 | 3/20 | 0.38 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.38 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.38 |
| ▸ | DGKA | P23743 | 1/20 | 0.35 |
| ▸ | HPGD | P15428 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | HTR2C | P28335 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26756764 | 0.92 | LMNA (0.38) | ADRA2AADRA1AMAPTBLMTSHR | |
| SCHEMBL8842750 | 0.86 | TSHR (0.45) | ADRA2AADRA1AMAPTBLMTSHR | |
| SCHEMBL12547083 | 0.81 | TSHR (0.60) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL542338 | 0.80 | DGKA (0.45) | ADRA2AADRA1AMAPTTSHRALDH1A1 | |
| SCHEMBL9258220 | 0.80 | TSHR (0.39) | ADRA2AADRA1AMAPTBLMTSHR | |
| SCHEMBL5613230 | 0.80 | TSHR (0.58) | ADRA2AADRA1AMAPTTSHRALDH1A1 | |
| SCHEMBL5674610 | 0.79 | TSHR (0.46) | MAPTTSHRALDH1A1TP53HIF1A | |
| SCHEMBL21224499 | 0.79 | TSHR (0.40) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL10708633 | 0.79 | ALDH1A1 (0.43) | MAPTTSHRALDH1A1TP53HIF1A | |
| SCHEMBL14400928 | 0.78 | TSHR (0.46) | ADRA2AADRA1AMAPTBLMTSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114269865-B | Radiation curable composition for plating applications | 爱克发-格法特公司 | 2024-07-02 | — | — | CN | claimed |
| CN-118202796-A | Method for plating printed circuit board | 爱克发-格法特公司 | 2024-06-14 | — | — | CN | claimed |
| CN-108698914-B | Method for producing etched glass articles | 爱克发-格法特公司 | 2022-11-01 | — | — | CN | claimed |
| CN-114269865-A | Radiation curable compositions for plating applications | 爱克发-格法特公司 | 2022-04-01 | — | — | CN | claimed |
| CN-108698915-B | Method for producing etched glass articles | 爱克发-格法特公司 | 2021-10-01 | — | — | CN | claimed |
| CN-106715607-B | Etch resistant inkjet inks for making conductive patterns | 爱克发-格法特公司 | 2020-08-07 | — | — | CN | claimed |
| CN-114269865-B | Radiation curable composition for plating applications | 爱克发-格法特公司 | 2024-07-02 | — | — | CN | disclosed |
| CN-118202796-A | Method for plating printed circuit board | 爱克发-格法特公司 | 2024-06-14 | — | — | CN | disclosed |
| CN-109062007-B | Positive photosensitive polysiloxane composition and application thereof | 奇美实业股份有限公司 | 2023-03-10 | — | — | CN | disclosed |
| CN-115542666-A | Photosensitive resin composition for spacer and protective film | 奇美实业股份有限公司 | 2022-12-30 | — | — | CN | disclosed |
| CN-108693710-B | Positive photosensitive polysiloxane composition | 奇美实业股份有限公司 | 2022-12-02 | — | — | CN | disclosed |
| CN-108698914-B | Method for producing etched glass articles | 爱克发-格法特公司 | 2022-11-01 | — | — | CN | disclosed |
| CN-114269865-A | Radiation curable compositions for plating applications | 爱克发-格法特公司 | 2022-04-01 | — | — | CN | disclosed |
| US-20130208215-A1 | COLOR LIQUID CRYSTAL DISPLAY DEVICE | CHI MEI CORPORATION (TW) | 2013-08-15 | — | — | US | disclosed |
| US-8470503-B2 | Photosensitive resin composition for color filter and color filter using same | CHI MEI CORPORATION (TW) | 2013-06-25 | — | — | US | disclosed |
| US-20130142966-A1 | BLUE PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTERS AND USES THEREOF | CHI MEI CORPORATION (TW) | 2013-06-06 | — | — | US | disclosed |
| US-20120162575-A1 | COLOR LIQUID CRYSTAL DISPLAY DEVICE | CHI MEI CORPORATION (TW) | 2012-06-28 | — | — | US | disclosed |
| US-20120057098-A1 | COLOR LIQUID CRYSTAL DISPLAY DEVICE | CHI MEI CORPORATION (TW) | 2012-03-08 | — | — | US | disclosed |
| US-20110228201-A1 | Photosensitive resin composition for color filter and color filter using same | CHI-MEI CORPORATION | 2011-09-22 | — | — | US | disclosed |
| US-5654348-A | FIBER IMPREGNATED WITH ALCOHOL OR GLYCOL ACRYLATE OR METHACRYLATE, GLYCOL DIGLYCIDYL ETHER, TREATED WITH ULTRAVIOLET RADIATION | KABUSHIKI KAISHA KOBE SEIKO SHO (JP) | 1997-08-05 | — | — | US | disclosed |