Imidazole

Imidazole

SCHEMBL14973284

N#CCCn1ccnc1-c1ccccc1.O=C(O)c1ccc(C(=O)O)c(C(=O)O)c1.c1c[nH]cn1.c1c[nH]cn1

nearest known ligand 0.43

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.43
PLAA Q9Y263 1/20 0.40
ALPG P10696 1/20 0.40
CA12 O43570 1/20 0.36
CA1 P00915 1/20 0.36
CA2 P00918 1/20 0.36
CA3 P07451 1/20 0.36
CA4 P22748 1/20 0.36
CA6 P23280 1/20 0.36
CA5A P35218 1/20 0.36
CA7 P43166 1/20 0.36
CA9 Q16790 1/20 0.36
CA13 Q8N1Q1 1/20 0.36
CA14 Q9ULX7 1/20 0.36
CA5B Q9Y2D0 1/20 0.36
KDM4E B2RXH2 3/20 0.33
ALDH1A1 P00352 2/20 0.33
TDP1 Q9NUW8 1/20 0.33
NTRK1 P04629 1/20 0.32
CTSZ Q9UBR2 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31484739 0.92 ESR1 (0.51) ESR1PLAAALPGCA12CA1
SCHEMBL29713435 0.92 ESR1 (0.51) ESR1PLAAALPGCA12CA1
SCHEMBL154797 0.92 ESR1 (0.51) ESR1PLAAALPGCA12CA1
SCHEMBL441418 0.92 ESR1 (0.51) ESR1PLAAALPGCA12CA1
SCHEMBL29389820 0.81 ESR1 (0.58) ESR1PLAAALPGCA12CA1
SCHEMBL31484734 0.78 ALPL (0.42) PLAAALPGKDM4EALDH1A1CTSZ
SCHEMBL442104 0.78 ALPL (0.42) PLAAALPGKDM4EALDH1A1CTSZ
SCHEMBL811491 0.78 ALPL (0.42) PLAAALPGKDM4EALDH1A1CTSZ
Benzene SCHEMBL28264459 0.76 KDM4E (0.50) KDM4EALDH1A1TDP1GAACDC25A
SCHEMBL17351652 0.76 KDM4E (0.43) ESR1PLAAALPGCA12CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9368421-B2 Under-fill material and method for producing semiconductor device NITTO DENKO CORPORATION (JP) 2016-06-14 US disclosed
US-20150270188-A1 Under-Fill Material and Method for Producing Semiconductor Device NITTO DENKO CORPORATION (JP) 2015-09-24 US disclosed
US-9085685-B2 Under-fill material and method for producing semiconductor device NITTO DENKO CORPORATION (JP) 2015-07-21 US disclosed
US-20140002226-A1 INDUCTOR AND METHOD OF MANUFACTURING THE SAME SAMSUNG ELECTRO-MECHANICS CO., LTD. (KR) 2014-01-02 US disclosed
US-20130137218-A1 UNDER-FILL MATERIAL AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE NITTO DENKO CORPORATION (JP) 2013-05-30 US disclosed