Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MDM4 | O15151 | 1/20 | 0.41 |
| ▸ | CA2 | P00918 | 3/20 | 0.39 |
| ▸ | CA1 | P00915 | 2/20 | 0.39 |
| ▸ | CYP2A6 | P11509 | 2/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | CA12 | O43570 | 1/20 | 0.39 |
| ▸ | CA3 | P07451 | 1/20 | 0.39 |
| ▸ | CA6 | P23280 | 1/20 | 0.39 |
| ▸ | CA9 | Q16790 | 1/20 | 0.39 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.39 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.38 |
| ▸ | CHUK | O15111 | 1/20 | 0.38 |
| ▸ | IMPDH2 | P12268 | 1/20 | 0.38 |
| ▸ | IMPDH1 | P20839 | 1/20 | 0.38 |
| ▸ | AR | P10275 | 1/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29540307 | 1.00 | MDM4 (0.41) | MDM4CA2CA1CYP2A6ALDH1A1 | |
| SCHEMBL642740 | 0.93 | CA1 (0.48) | MDM4CA2CA1ALDH1A1HSD11B1 | |
| SCHEMBL13074276 | 0.81 | CA2 (0.43) | CA2CA1CYP2A6ALDH1A1CA12 | |
| SCHEMBL16213053 | 0.77 | TSHR (0.57) | CA2CA1CYP2A6ALDH1A1CA12 | |
| SCHEMBL30462444 | 0.76 | CA1 (0.54) | CA2CA1ALDH1A1KDM4EMEN1 | |
| SCHEMBL18934329 | 0.75 | CA1 (0.53) | CA2CA1CYP2A6ALDH1A1AR | |
| SCHEMBL13037655 | 0.74 | CA2 (0.57) | CA2CA1CYP2A6ALDH1A1CA12 | |
| SCHEMBL5349611 | 0.73 | LMNA (0.42) | MDM4CYP2A6ALDH1A1KDM4EMEN1 | |
| SCHEMBL7720311 | 0.73 | CYP2A6 (0.48) | CA2CA1CYP2A6ALDH1A1CA12 | |
| SCHEMBL6324065 | 0.73 | CA1 (0.56) | CA2CA1ALDH1A1ARKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 187 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5100762-A | Radiation-sensitive polymer and radiation-sensitive composition containing the same | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 1992-03-31 | — | — | US | claimed |
| US-4341852-A | Polycyanoanthracenes and use as sensitizers for electrophotographic compositions | EASTMAN KODAK COMPANY (US) | 1982-07-27 | — | — | US | claimed |
| US-12473458-B2 | Sealing method | NITTO DENKO CORPORATION (JP) | 2025-11-18 | — | — | US | disclosed |
| EP-4613256-A1 | DENTAL ADHESIVE COMPOSITION | Kuraray Noritake Dental Inc. (JP) | 2025-09-10 | — | — | EP | disclosed |
| EP-3816257-B1 | SEALANT SHEET | NITTO DENKO CORP (JP) | 2025-04-16 | — | — | EP | disclosed |
| US-12234387-B2 | Sealant sheet | NITTO DENKO CORPORATION (JP) | 2025-02-25 | — | — | US | disclosed |
| CN-114867813-B | Sealing method | 日东电工株式会社 | 2024-12-13 | — | — | CN | disclosed |
| CN-114867600-B | Sealant sheet with release liner | 日东电工株式会社 | 2024-11-26 | — | — | CN | disclosed |
| US-20240191114-A1 | SEALANT SHEET | NITTO DENKO CORPORATION (JP) | 2024-06-13 | — | — | US | disclosed |
| EP-3816258-B1 | SEALANT SHEET | NITTO DENKO CORP (JP) | 2024-06-12 | — | — | EP | disclosed |
| WO-2024096019-A1 | DENTAL ADHESIVE COMPOSITION | クラレノリタケデンタル株式会社 | 2024-05-10 | — | — | WO | disclosed |
| US-6569600-B2 | Optical apparatus comprising binders, sensitizers and reactants capable of undergoing rearrangements when exposed to actinic radiation causing optical changes such as refractive index | EASTMAN KODAK COMPANY | 2003-05-27 | — | — | US | disclosed |
| US-20030072250-A1 | When exposed to actinic radiation produces a change in optical properties in the exposed region, contains a binder, a reactant capable of undergoing a transformation upon an electrone oxidation, and a sensitizer | EASTMAN KODAK COMPANY | 2003-04-17 | — | — | US | disclosed |
| EP-1246179-A2 | Optical recording material | EASTMAN KODAK COMPANY (US) | 2002-10-02 | — | — | EP | disclosed |
| US-5100762-A | Radiation-sensitive polymer and radiation-sensitive composition containing the same | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 1992-03-31 | — | — | US | disclosed |
| EP-0425142-A2 | Positive acting photoresist and method of producing same | ROHM AND HAAS COMPANY (US) | 1991-05-02 | — | — | EP | disclosed |
| US-4859551-A | Process for preparing positive and negative images using photohardenable electrostatic master | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1989-08-22 | — | — | US | disclosed |
| US-4849314-A | PHOTOPOLYMERIZATION | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1989-07-18 | — | — | US | disclosed |
| US-4341852-A | Polycyanoanthracenes and use as sensitizers for electrophotographic compositions | EASTMAN KODAK COMPANY (US) | 1982-07-27 | — | — | US | disclosed |
| US-4341852-A | Polycyanoanthracenes and use as sensitizers for electrophotographic compositions | EASTMAN KODAK COMPANY (US) | 1982-07-27 | — | — | US | disclosed |