SCHEMBL149918

SCHEMBL149918

C=C(C)C(=O)OCCC(CO)(CCOC(=O)C(=C)C)n1c(=O)[nH]c(=O)[nH]c1=O

nearest known ligand 0.36

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.36
TSHR P16473 3/20 0.36
POLB P06746 1/20 0.32
APEX1 P27695 1/20 0.32
HTT P42858 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
CA1 P00915 2/20 0.30
CA2 P00918 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8083935 0.87 THRB (0.35) THRBTSHRPOLBAPEX1HTT
SCHEMBL6903420 0.87 THRB (0.35) THRBTSHRPOLBAPEX1HTT
SCHEMBL7925926 0.81 THRB (0.39) THRBTSHR
SCHEMBL9456751 0.77 TSHR (0.35) THRBTSHR
SCHEMBL149919 0.77 THRB (0.37) THRBTSHRPOLBAPEX1HTT
SCHEMBL9696445 0.74 TSHR (0.32) TSHR
SCHEMBL831001 0.74 THRB (0.42) THRBTSHRPOLBAPEX1HTT
SCHEMBL16143278 0.73 TSHR (0.38) THRBTSHRPOLBAPEX1HTT
SCHEMBL153711 0.73 TSHR (0.33) TSHR
SCHEMBL6673961 0.73 THRB (0.45) THRBTSHRPOLBAPEX1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 181 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1636274-B1 PHOTOCURABLE RESIN COMPOSITION DSM IP ASSETS BV (NL) 2009-08-12 EP claimed
US-20070096355-A1 Photocurable resin composition YASHIRO TAKAO 2007-05-03 US claimed
EP-1636274-A1 PHOTOCURABLE RESIN COMPOSITION DSM IP Assets B.V. (NL) 2006-03-22 EP claimed
WO-2004113395-A1 PHOTOCURABLE RESIN COMPOSITION DSM IP ASSETS B.V. (NL) 2004-12-29 WO claimed
US-20240181756-A1 TRANSFER FILM, HARD COAT FILM, HARD-COATED FORMED ARTICLE, AND METHOD FOR MANUFACTURING HARD-COATED FORMED ARTICLE DAI NIPPON PRINTING CO., LTD. (JP) 2024-06-06 US disclosed
WO-2024075471-A1 ACRYLIC COMPOUND CONTAINING FLUOROPOLYETHER GROUP, ACTINIC-RAY-CURABLE COMPOSITION, CURED COATING FILM FORMED FROM SAID CURABLE COMPOSITION, AND ARTICLE 信越化学工業株式会社 2024-04-11 WO disclosed
EP-4342922-A1 FLUOROACRYLIC COMPOSITION, FLUOROCHEMICAL ACTINIC-RAY-CURABLE COMPOSITION, AND ARTICLE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-03-27 EP disclosed
WO-2024058138-A1 HEAD-UP DISPLAY SYSTEM AND OPTICALLY FUNCTIONAL LAYER FOR HEAD-UP DISPLAY 日本化薬株式会社 2024-03-21 WO disclosed
EP-3603954-B1 POLYMER SUBSTRATE WITH HARD COAT LAYER TEIJIN LTD (JP) 2024-03-20 EP disclosed
US-11897989-B2 Fluorine-containing curable composition and article SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-02-13 US disclosed
EP-4316772-A1 TRANSFER FILM, HARDCOAT FILM, HARDCOAT MOLDED ARTICLE AND METHOD FOR PRODUCING SAME Dai Nippon Printing Co., Ltd. (JP) 2024-02-07 EP disclosed
EP-4310558-A1 OPTICAL FUNCTIONAL FILM FOR HEAD-UP DISPLAY, OPTICAL LAMINATE, FUNCTIONAL GLASS, AND HEAD-UP DISPLAY SYSTEM Nippon Kayaku Kabushiki Kaisha (JP) 2024-01-24 EP disclosed
US-5084538-A HIGH SURFACE HARDNESS TRANSPARENT RESIN PREPARED FROM A COMPOUND HAVING AT LEAST ONE ISOPROPENYL PHENYL GROUP MITSUI TOATSU CHEMICALS, INC. (JP) 1992-01-28 US disclosed
US-5053316-A THERMOPLASTIC ELASTOMER AND PHOTOSENSITIVE RESIN COMPOSITION BASED THEREON, AND PRINTING PLATE PRECURSOR COMPRISING THE COMPOSITION ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1991-10-01 US disclosed
EP-0385457-A2 High surface hardness transparent resin and polymerizable monomer MITSUI TOATSU CHEMICALS, Inc. (JP) 1990-09-05 EP disclosed
US-4910114-A High molecular weight addition polymer HITACHI CHEMICAL COMPANY, LTD. (JP) 1990-03-20 US disclosed
EP-0348063-A1 Thermoplastic elastomer and photosensitive resin composition based thereon, and printing plate precursor comprising the composition Asahi Kasei Kogyo Kabushiki Kaisha (JP) 1989-12-27 EP disclosed
US-4888269-A EPOXY VINYL ESTER RESIN, PHOTOPOLYMERIZATION INHITIATOR, AMINE CURING AGENT DAINIPPON INK & CHEMICALS, INC. (JP) 1989-12-19 US disclosed
EP-0243501-A1 CURABLE COMPOSITION AND METHOD FOR MOLDING IT SHOWA DENKO KABUSHIKI KAISHA (JP) 1987-11-04 EP disclosed
US-4686166-A HIGH IMAGE DENSITY, ANTIFOGGING AGENT HITACHI CHEMICAL CO. (JP) 1987-08-11 US disclosed